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The Analysis of Ti Nano-Films Prepared by Ion Beam DepositionChang, Han-yun 21 July 2005 (has links)
Ti nano-films are deposited on a NaCl(001) single crystal substrate by ion beam sputtering from a Ti target, and then annealed. Ti crystallites on a NaCl(001) substrate with increase in the substrate temperature and annealing have the preferred orientation (1-101) and (0001).
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