Spelling suggestions: "subject:"vapor calating"" "subject:"vapor caculating""
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Carbon/carbon composites by forced flow-thermal gradient chemical vapor infiltration (FCVI) processVaidyaraman, Sundararaman 12 1900 (has links)
No description available.
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Nondestructive examination of chemical vapor infiltration of 0°/90° SiC/Nicalon compositesLee, Sangbeom 12 1900 (has links)
No description available.
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Optimization of chemical vapor infiltration of ceramic matrix compositesChiang, Daniel Young 12 1900 (has links)
No description available.
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The study of alternating flow chemical vapor infiltration and a novel kinetics determination technique for the vapor deposition of silicon carbide via the decomposition of methyltrichlorosilaneChiang, Daniel Young 12 1900 (has links)
No description available.
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Frequency dependent properties of modified CVD grown PbTiO₃ and La-doped PbTiO₃ thin filmsKushwaha, Alpa 12 1900 (has links)
No description available.
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Chemical vapor deposition reactor design and process optimization for the deposition of copper thin films /Stephens, Alan Thomas. January 1994 (has links)
Thesis (M.S.)--Rochester Institute of Technology, 1994. / Typescript. Includes bibliographical references (leaves 134-137).
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Formation of low temperature silicon dioxide films using chemical vapor deposition /Chen, Hsiao-Hui. January 1991 (has links)
Thesis (M.S.)--Rochester Institute of Technology, 1991. / Typescript. Includes bibliographical references (leaves 165-168).
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An apparatus for the vapor phase epitaxial deposition of germaniumHanson, Charles Geoffrey, January 1965 (has links)
Thesis (M.S.)--University of Wisconsin--Madison, 1966. / eContent provider-neutral record in process. Description based on print version record. Bibliography: l. 36-38.
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Optimization and evaluation of germanium vapor phase epitaxial growth parametersOberlin, David W., January 1966 (has links)
Thesis (M.S.)--University of Wisconsin--Madison, 1966. / eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references.
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A single-source technique for vacuum deposition of alloy filmsChai, An-Ti. January 1966 (has links)
LD2668 .T4 1966 C434 / Master of Science
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