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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
1

Fractional crystallization from melts

Wilcox, William R. January 1960 (has links)
Thesis (Ph. D. in Chemical Engineering)--University of California, Berkeley, Sept. 1960. / Also issues as UCRL-9213. Includes bibliographical references (leaves 233-239).
2

Time resolved reflectivity studies of electron beam processing of semiconductors

Timans, P. J. January 1987 (has links)
This work describes methods for making dynamic observations of the effects of electron beam heating, in a range of applications to semiconductors. The studies were based on the use of the time resolved reflectivity (TRR) method, in which the reflectivity of the specimens surface is measured during the heating cycle. The best experimental conditions for this technique have been identified and several applications are described in detail. Studies were made of epitaxial regrowth of amorphous layers created by ion implantation into silicon. The TRR method was applied using red and infra-red wavelengths, to characterize the regrowth kinetics, paying special attention to the influence of electrically active dopants. The results demonstrate that doping has a large effect on the regrowth process, for reasons which are related to both electrical and structural factors. The use of isothermal electron beam heating for annealing silicon-on-sapphire (SOS) specimens was investigated. In these studies, the TRR technique was applied to measurement of the temperature of the specimens and to observation of epitaxial recrystallization of amorphous layers created by self-implantation. In SOS films the amorphous layers could be at the surface or buried beneath a thin single crystal layer, and these cases resulted in different regrowth behaviour. TRR methods using green and red probe wavelengths proved to be sensitive to the type of crystallization, as well as the rate at which it occurs. They should also help to identify the best conditions for improvement of the crystal quality of SOS films. TRR was also used to examine heating of silicon-on-insulator materials by swept line electron beams. Temperature distributions were evaluated by measuring the reflectivity of a small area as the electron beam passed through it and the effects of various changes in the heating conditions were explored. Studies were made of zone melting recrystallization by observing the abrupt reflectivity changes which occur when silicon melts or freezes. In future work, TRR techniques could be developed to allow detailed investigation of the recrystallization process in structures intended for seeded recrystallization.
3

Zone refining, alloying, and single crystal growth

Harmsen, Carl Herman. January 1962 (has links)
Thesis (M.S.)--University of Wisconsin--Madison, 1962. / Typescript. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references (leaf 58).
4

A fusão zonal horizontal aplicada ao crescimento de policristais grosseiros de alumínio

Klein, Cândida Cristina January 2009 (has links)
A fusão zonal compreende uma família de métodos para controle e distribuição de impurezas na qual uma pequena zona fundida é deslocada lentamente ao longo de um material sólido, redistribuindo o soluto. Ela é utilizada na purificação de materiais, num processo denominado refino zonal, mas também pode ser usada na distribuição homogênea ou descontínua de impurezas e no crescimento de cristais. A fusão zonal aplicada ao crescimento de grãos, visando a obtenção de materiais mono ou policristalinos com grãos grosseiros é denominada recristalização por fusão zonal (ZMR) e seu uso principal é na preparação de materiais para fabricação de dispositivos eletrônicos e fotovoltaicos, especialmente em silício. Na última década, o progresso na tecnologia ZMR foi feito principalmente em três campos: desenvolvimento de equipamento, controle de processo e modelagem numérica, mas somente algumas pesquisas abordam a fusão zonal a baixas temperaturas e restringem a aplicação do método a outros materiais semicondutores como os elementos do grupo III, IV ou V. Deste modo, o presente trabalho tem como objetivo verificar a influência da velocidade de varredura, da largura da zona fundida e do número de passadas no processo de fusão zonal de materiais de baixo ponto de fusão, em relação à obtenção de materiais policristalinos com grãos grosseiros. Para tanto, construiu-se um equipamento de fusão zonal horizontal e barras de alumínio puro (P0610) foram submetidas ao processo, variando os parâmetros acima referidos. A macroestrutura das amostras foi analisada e os resultados obtidos do número de grãos/área foram interpretados, verificando a influência dos parâmetros físicos anteriormente citados, do gradiente térmico e do super-resfriamento constitucional. Verificou-se que a redução na velocidade de varredura e na largura da zona fundida, de modo geral, mostrou-se eficiente em relação à diminuição do número de grãos por área. Os resultados obtidos indicam que a fusão zonal foi efetiva na obtenção de alumínio policristalino com grãos grosseiros e colaboram para melhorar a compreensão do processo. / The zone melting comprises a family of methods to control and to distribute impurities in which a small molten zone is moved slowly along a solid material, redistributing solute. It is used in materials purification, in a so-called zone refining process, but can also be used in homogeneous or discontinuous distribution of impurities and crystal growth. The zone melting applied to grain enlargement, leading to attain singlecrystalline or polycrystalline materials with coarse grains is so-called zone melting recrystallization (ZMR) and its major use is the preparation of materials for electronic and photovoltaic devices process especially silicon. In the last decade, progress in ZMR technology was done mainly in three areas: equipment development, process control, and numerical modeling, but only a few researches handle on zone melting at low temperatures and it limits the application of the method to other semiconductor materials such as III, IV or V group elements. Thus, this study aims to examine the influence of scan rate, zone width and the number of zone passes in the zone melting process of low melting point materials about getting polycrystalline materials with coarse grains. For this, horizontal zone melting equipment was built and pure aluminum bars (P0610) were zone melted, varying the parameters mentioned above. The macrostructure of the samples was analyzed and the results of the number of grains per area were assessed by checking the influence of physical parameters previously mentioned and the thermal gradient and the constitutional supercooling. It was found that scan rate and zone width reduction in general, proved to be efficient in reducing the number of grains per area. The results indicate that the zone melting was effective in obtaining aluminum polycrystalline coarse-grained and collaborate to improve the understanding of the process.
5

A fusão zonal horizontal aplicada ao crescimento de policristais grosseiros de alumínio

Klein, Cândida Cristina January 2009 (has links)
A fusão zonal compreende uma família de métodos para controle e distribuição de impurezas na qual uma pequena zona fundida é deslocada lentamente ao longo de um material sólido, redistribuindo o soluto. Ela é utilizada na purificação de materiais, num processo denominado refino zonal, mas também pode ser usada na distribuição homogênea ou descontínua de impurezas e no crescimento de cristais. A fusão zonal aplicada ao crescimento de grãos, visando a obtenção de materiais mono ou policristalinos com grãos grosseiros é denominada recristalização por fusão zonal (ZMR) e seu uso principal é na preparação de materiais para fabricação de dispositivos eletrônicos e fotovoltaicos, especialmente em silício. Na última década, o progresso na tecnologia ZMR foi feito principalmente em três campos: desenvolvimento de equipamento, controle de processo e modelagem numérica, mas somente algumas pesquisas abordam a fusão zonal a baixas temperaturas e restringem a aplicação do método a outros materiais semicondutores como os elementos do grupo III, IV ou V. Deste modo, o presente trabalho tem como objetivo verificar a influência da velocidade de varredura, da largura da zona fundida e do número de passadas no processo de fusão zonal de materiais de baixo ponto de fusão, em relação à obtenção de materiais policristalinos com grãos grosseiros. Para tanto, construiu-se um equipamento de fusão zonal horizontal e barras de alumínio puro (P0610) foram submetidas ao processo, variando os parâmetros acima referidos. A macroestrutura das amostras foi analisada e os resultados obtidos do número de grãos/área foram interpretados, verificando a influência dos parâmetros físicos anteriormente citados, do gradiente térmico e do super-resfriamento constitucional. Verificou-se que a redução na velocidade de varredura e na largura da zona fundida, de modo geral, mostrou-se eficiente em relação à diminuição do número de grãos por área. Os resultados obtidos indicam que a fusão zonal foi efetiva na obtenção de alumínio policristalino com grãos grosseiros e colaboram para melhorar a compreensão do processo. / The zone melting comprises a family of methods to control and to distribute impurities in which a small molten zone is moved slowly along a solid material, redistributing solute. It is used in materials purification, in a so-called zone refining process, but can also be used in homogeneous or discontinuous distribution of impurities and crystal growth. The zone melting applied to grain enlargement, leading to attain singlecrystalline or polycrystalline materials with coarse grains is so-called zone melting recrystallization (ZMR) and its major use is the preparation of materials for electronic and photovoltaic devices process especially silicon. In the last decade, progress in ZMR technology was done mainly in three areas: equipment development, process control, and numerical modeling, but only a few researches handle on zone melting at low temperatures and it limits the application of the method to other semiconductor materials such as III, IV or V group elements. Thus, this study aims to examine the influence of scan rate, zone width and the number of zone passes in the zone melting process of low melting point materials about getting polycrystalline materials with coarse grains. For this, horizontal zone melting equipment was built and pure aluminum bars (P0610) were zone melted, varying the parameters mentioned above. The macrostructure of the samples was analyzed and the results of the number of grains per area were assessed by checking the influence of physical parameters previously mentioned and the thermal gradient and the constitutional supercooling. It was found that scan rate and zone width reduction in general, proved to be efficient in reducing the number of grains per area. The results indicate that the zone melting was effective in obtaining aluminum polycrystalline coarse-grained and collaborate to improve the understanding of the process.
6

A fusão zonal horizontal aplicada ao crescimento de policristais grosseiros de alumínio

Klein, Cândida Cristina January 2009 (has links)
A fusão zonal compreende uma família de métodos para controle e distribuição de impurezas na qual uma pequena zona fundida é deslocada lentamente ao longo de um material sólido, redistribuindo o soluto. Ela é utilizada na purificação de materiais, num processo denominado refino zonal, mas também pode ser usada na distribuição homogênea ou descontínua de impurezas e no crescimento de cristais. A fusão zonal aplicada ao crescimento de grãos, visando a obtenção de materiais mono ou policristalinos com grãos grosseiros é denominada recristalização por fusão zonal (ZMR) e seu uso principal é na preparação de materiais para fabricação de dispositivos eletrônicos e fotovoltaicos, especialmente em silício. Na última década, o progresso na tecnologia ZMR foi feito principalmente em três campos: desenvolvimento de equipamento, controle de processo e modelagem numérica, mas somente algumas pesquisas abordam a fusão zonal a baixas temperaturas e restringem a aplicação do método a outros materiais semicondutores como os elementos do grupo III, IV ou V. Deste modo, o presente trabalho tem como objetivo verificar a influência da velocidade de varredura, da largura da zona fundida e do número de passadas no processo de fusão zonal de materiais de baixo ponto de fusão, em relação à obtenção de materiais policristalinos com grãos grosseiros. Para tanto, construiu-se um equipamento de fusão zonal horizontal e barras de alumínio puro (P0610) foram submetidas ao processo, variando os parâmetros acima referidos. A macroestrutura das amostras foi analisada e os resultados obtidos do número de grãos/área foram interpretados, verificando a influência dos parâmetros físicos anteriormente citados, do gradiente térmico e do super-resfriamento constitucional. Verificou-se que a redução na velocidade de varredura e na largura da zona fundida, de modo geral, mostrou-se eficiente em relação à diminuição do número de grãos por área. Os resultados obtidos indicam que a fusão zonal foi efetiva na obtenção de alumínio policristalino com grãos grosseiros e colaboram para melhorar a compreensão do processo. / The zone melting comprises a family of methods to control and to distribute impurities in which a small molten zone is moved slowly along a solid material, redistributing solute. It is used in materials purification, in a so-called zone refining process, but can also be used in homogeneous or discontinuous distribution of impurities and crystal growth. The zone melting applied to grain enlargement, leading to attain singlecrystalline or polycrystalline materials with coarse grains is so-called zone melting recrystallization (ZMR) and its major use is the preparation of materials for electronic and photovoltaic devices process especially silicon. In the last decade, progress in ZMR technology was done mainly in three areas: equipment development, process control, and numerical modeling, but only a few researches handle on zone melting at low temperatures and it limits the application of the method to other semiconductor materials such as III, IV or V group elements. Thus, this study aims to examine the influence of scan rate, zone width and the number of zone passes in the zone melting process of low melting point materials about getting polycrystalline materials with coarse grains. For this, horizontal zone melting equipment was built and pure aluminum bars (P0610) were zone melted, varying the parameters mentioned above. The macrostructure of the samples was analyzed and the results of the number of grains per area were assessed by checking the influence of physical parameters previously mentioned and the thermal gradient and the constitutional supercooling. It was found that scan rate and zone width reduction in general, proved to be efficient in reducing the number of grains per area. The results indicate that the zone melting was effective in obtaining aluminum polycrystalline coarse-grained and collaborate to improve the understanding of the process.
7

Novel composites for nonlinear optics

Hameed-Muhammed, Muhammed Subhi January 1999 (has links)
No description available.
8

Development of a horizontal zone refiner for optimization studies

Haas, Jordan January 2006 (has links)
Many of the physical properties of semiconductor materials depend on the presence of imperfections. A significant source of lattice imperfections is the inclusion of foreign atoms, or impurities; since most semiconductor devices require accurate and repeatable results, highly pure materials are desired. In order to obtain high purity semiconductor metals. zone purification is commonly utilized as the final purification stage. Due to the demand for increasing purity in an extremely competitive industry. producers must increase process efficiency and reduce production costs. The University of Victoria Crystal Growth Lab Group (CGL) is participating in a project aimed at increasing the efficiency of a commercial zone refining system. The project is composed of two parts: a numerical analysis intended to simulate the process. and an experimental study intended to verify the numerical model and conduct optimization experiments. A zone refiner was designed and developed in the lab for the experimental portion of the project. This thesis details the experimental portion of the project. The CGL zone refiner will be used to study the effects of zone geometry and mixing on the efficiency of the process. In order to achieve the most efficient possible combination. the zone refiner was constructed with the capability to adjust all of the typical process variables such as zone speed, zone spacing, and number of zone passes. as well as to accommodate specific methods aimed at increasing mixing in the melt such as applying an electric current or a rotating magnetic field. Once the CGL zone refiner system was complete, several experiments were carried out to prove and characterize the system. Samples were removed from the purified ingots and sent for glow discharge mass spectrometry (GDMS) analysis. The GDMS results indicated that the CGL zone refiner purified the ingot as desired and that there were no external sources of contamination from the process: in general, a reduction in concentration was seen for the impurities tested. During both the initial thermal testing and the subsequent full process experiments, the zone refiner performed as expected and without difficulty. The entire process was qualified and determined to be stable and easily controlled. The experiments conducted to date have shown that the system is a capable zone refiner for all of the planned studies.
9

Sintese e refino por zona de fluoretos para crescimento de cristais laser: BaLiF sub(3):Co sup(2)

LOPES, ARTUR J. da S. 09 October 2014 (has links)
Made available in DSpace on 2014-10-09T12:46:08Z (GMT). No. of bitstreams: 0 / Made available in DSpace on 2014-10-09T13:59:59Z (GMT). No. of bitstreams: 1 07531.pdf: 3726046 bytes, checksum: b6529bbc772b1dbd5d07980b9fc50ca0 (MD5) / Dissertacao (Mestrado) / IPEN/D / Instituto de Pesquisas Energeticas e Nucleares - IPEN/CNEN-SP
10

Desenvolvimento e avaliação de um metodo semi-continuo de fusão zonal e sua aplicação na recuperação de indio / Development and evaluation of a semi-continuous zone melting method and its application on indium recovery

Chaves, Ricardo Risso 03 March 1999 (has links)
Orientador: Rubens Caram Junior / Dissertação (mestrado) - Universidade Estadual de Campinas, Faculdade de Engenharia Mecanica / Made available in DSpace on 2018-07-22T02:53:41Z (GMT). No. of bitstreams: 1 Chaves_RicardoRisso_M.pdf: 6259336 bytes, checksum: 8f28236a72aaf02db8ce4c16083702ab (MD5) Previous issue date: 1997 / Resumo: O processo de fusão zonal consiste na passagem de uma ou mais zonas líquidas através de uma barra do material a ser purificado. Como variáveis do processo, tem-se: velocidade de solidificação, gradiente térmico junto à interface sólido-líquido, convecção imposta ao líquido e tamanho da zona líquida. O presente trabalho tem como objetivo apresentar uma solução à baixa produtividade dos métodos de purificação baseados na teoria de solidificação. Inicialmente, o método aqui proposto foi analisado através de sua simulação numérica e de experimentos utilizando ligas de SnPb. As amostras processadas foram caracterizadas pela técnica de espectrometria de absorção atômica. Finalmente, o método concebido foi aplicado à purificação de índio e por meio da técnica de espectrometria de emissão atômica, comprovou-se a viabilidade da técnica concebida. Os resultados obtidos indicam que o método aqui descrito tem maior produtividade que os métodos de fusão zonal tradicionais / Abstract: The zone refining process consists of the movement of one or more melted zones along the bar of the material which purification is desired. This purification process presents as variables: solidification rate, thermal gradient in front of the solid/liquid interface, convection imposed to the liquid and relative size of melted zone. The present work aims to introduce a solution to the problem of low production rate of the purification methods based on the solidification theory. Firstly, the proposed method was investigated by using numerical simulation. In addition, in order to evaluate the performance of this new version of the zone melt technique. an experimental apparatus was examined by the processing of a SnPb alloy. Atomic absorption spectroscopy was used to determine the chemical composition of the samples. Finally, this purification method was used to purify indium, which was characterized by using atomic emission spectrometry analysis. The results obtained show that the method described in this work has better performance than regular zone refining methods / Mestrado / Materiais / Mestre em Engenharia Mecânica

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