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Spectroscopic studies of boron carbo-nitrideAhearn, Wesley James 14 February 2011 (has links)
BCxNy films were characterized as a potential pore sealing layer for low κ dielectrics. The changes in chemical bonding were studied as a function of growth temperature to aid in understanding the variation in electrical performance of these films.
Thermal chemical vapor deposition of BCxNy using dimethylamine borane and ethylene
were deposited on porous methylsilsesquioxane substrates at 335 °C and 1 Torr. BCxNy
was able to seal the porous interface with a thickness of 3.9 nm for both blanket and
patterned substrates. BCxNy films deposited over a temperature range of 300-400 °C with
dimethylamine borane and either ethylene or ammonia coreactant gas were characterized.
Films deposited with ethylene became more concentrated in B at the expense of C with
increasing temperature. These films favored C-B intermixing over C-C and B-B bonding
at higher temperature. H was detected in the form of B-H and C-H bonds. Films
deposited with ammonia became concentrated in N at the expense of B, and favored B-N
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bonding at higher temperatures. H was found in the films as B-H, C-H, and N-H bonds.
The amount of H in the films decreased with increasing growth temperature for both
ethylene and ammonia coreacted films. The valence band offset of C-rich films increased
from 0.17 ± 0.22 eV to 0.32 ± 0.22 eV when deposited at 300°C and 400 °C. For the Nrich
films, the valence band offset shifted from 0.26 ± 0.28 at 300 °C to -0.15 ± 0.24 eV
at the same deposition conditions. High temperature annealing from 400-800 °C in
forming gas caused all BCxNy films to decrease in thickness up to 30%. At the same time,
the index of refraction increased, and likely, the dielectric constant. X-ray photoelectron
spectroscopy revealed little change in the constituent bonding, suggesting that volatile –H
containing species were removed during the annealing process. / text
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A limitação da responsabilidade das sociedades empresárias agrupadas em redes de cooperação empresarial: as associações de interesse econômico do estado do Rio Grande do SulCorrêa, Rodolfo Rubens Martins 24 September 2012 (has links)
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Previous issue date: 2012-09-24 / There is a new associative mechanism in Brazil referred to as a Business Cooperation Network (BCN) that has come to be utilized more and more frequently. BCNs consist of a clustering of small or middle-sized business entities that come together with the objective of the joint development of some activity that are common to all of them. This is achieved through the means of a new business entity formed for the purpose, even while the individual members maintain their own functional autonomy, owner's capital and legal identity as a company. Through the administrative policies developed by the government of the State of Rio Grande of the South, this new type of association has proliferated such that various BCNs are currently active. To the contrary of the configurations used in other countries, there is no legal personification to these business groupings; they have found in civil associations the most adequate structures to accommodate them. Therefore, the absence of proper norms for this new type of association has lead to legal problems that have no expressed solution in legislation. This research paper has the objective of filling in one of these voids. The question to be answered by the present study is whether or not the responsibility of answering to BCN liabilities and obligations corresponds to the member business entities clustered within them. The study has unfolded in three stages. Firstly, Brazilian legislation was analyzed with the purpose of finding answers to the questions raised. Secondly, a survey was carried out by visiting BCNs in the State of Rio Grande of the South in order to interview their directors and verify what practices they have adopted and what their perspectives are on them. Finally, a study of comparative rights was made to verify how the theme was treated in other countries where these clusters have their own legislation. The study sought to verify if there isn't a legal solution expressly provided for by law for this issue. From the survey it was discovered that the BCNs are consolidated as such, and that some of them are headed towards a new level of activity in this form. In almost all the countries studied, the option was for the subsidiary responsibility of the members of the BCNs as an offset to the lack of owner's capital. In conclusion, a coherent legal solution was sought to the issue in question based on all the facets of the study carried out / Há no Brasil um novo mecanismo associativo denominado rede de cooperação
empresarial que tem sido utilizado cada vez mais no meio empresarial. Rede de cooperação
empresarial consiste em um agrupamento de pequenas ou médias sociedades empresárias que
se unem com o fim de desenvolverem em conjunto algumas atividades que lhes são comuns,
através de uma nova pessoa jurídica constituída, mas mantendo a personalidade jurídica
própria e a autonomia funcional e patrimonial de cada associada. Através de políticas públicas
desenvolvidas pelo Governo do Estado do Rio Grande do Sul esse novo tipo associativo tem
proliferado e várias redes de cooperação estão em atividade atualmente. Ao contrário do que
ocorre em outros países, não há personificação jurídica própria para esses agrupamentos
empresariais, que encontraram na associação civil a estrutura mais adequada para abrigá-las.
Porém, a ausência de normas próprias para esse novo tipo associativo redunda em problemas
jurídicos sem solução expressa na legislação. Este trabalho tem por objetivo o preenchimento
de uma dessas lacunas. A indagação a ser respondida pelo presente estudo é se há ou não
responsabilidade subsidiária das sociedades empresárias agrupadas em redes de cooperação
empresarial pelas obrigações desta. A pesquisa se deu em três etapas. Primeiramente foi
analisada a legislação brasileira no intuito de encontrar respostas à questão suscitada. Em
segundo lugar foi realizada pesquisa de campo, por meio de visitas a redes de cooperação do
Estado do Rio Grande do Sul, para entrevistar seus dirigentes e verificar quais são as práticas
adotadas pelas mesmas e suas perspectivas. Por fim, realizou-se um estudo de direito
comparado para verificar como o tema é tratado nos países onde esses agrupamentos
empresariais têm legislação própria. Verificou-se não haver uma solução jurídica
expressamente prevista na lei para a questão levantada. Pela pesquisa de campo descobriu-se
que as redes de cooperação estão consolidadas como tais, e algumas delas caminham para um
novo nível de atividade em conjunto. Em quase todos os países estudados optou-se pela
responsabilidade subsidiária dos membros dos agrupamentos empresariais como uma
contrapartida à ausência de capital social. Concluindo, buscou-se apresentar uma solução
jurídica coerente ao problema levantado, com base em toda a pesquisa realizada
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Investigation On Electrical Properties Of Rf Sputtered Deposited Bcn Thin FilmsPrakash, Adithya 01 January 2013 (has links)
The ever increasing advancements in semiconductor technology and continuous scaling of CMOS devices mandate the need for new dielectric materials with low-k values. The interconnect delay can be reduced not only by the resistance of the conductor but also by decreasing the capacitance of dielectric layer. Also cross-talk is a major issue faced by semiconductor industry due to high value of k of the inter-dielectric layer (IDL) in a multilevel wiring scheme in Si ultra large scale integrated circuit (ULSI) devices. In order to reduce the time delay, it is necessary to introduce a wiring metal with low resistivity and a high quality insulating film with a low dielectric constant which leads to a reduction of the wiring capacitance. Boron carbon nitride (BCN) films are prepared by reactive magnetron sputtering from a B4C target and deposited to make metal-insulator-metal (MIM) sandwich structures using aluminum as the top and bottom electrodes. BCN films are deposited at various N2/Ar gas flow ratios, substrate temperatures and process pressures. The electrical characterization of the MIM devices includes capacitance vs. voltage (C-V), current vs voltage, and breakdown voltage characteristics. The above characterizations are performed as a function of deposition parameters.
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