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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
1

Advanced crystal growth techniques with III-V boron compound semiconductors

Whiteley, Clinton E. January 1900 (has links)
Doctor of Philosophy / Department of Chemical Engineering / James H. Edgar / Semiconducting icosahedral boron arsenide, B[subscript]12As[subscript]2, is an excellent candidate for neutron detectors and radioisotope batteries, for which high quality single crystals are required. Thus, the present study was undertaken to grow B[subscript]12As[subscript]2 crystals by precipitation from metal solutions (nickel) saturated with elemental boron and arsenic in a sealed quartz ampoule. B[subscript]12As[subscript]2 crystals of 8-10 mm were produced when a homogeneous mixture of the three elements was held at 1150 °C for 48-72 hours and slowly cooled (3°C/hr). The crystals varied in color and transparency from black and opaque to clear and transparent. X-ray topography (XRT), Raman spectroscopy, and defect selective etching confirmed that the crystals had the expected rhombohedral structure and a low density of defects (5x10[superscript]7 cm[superscript]-2). The concentrations of residual impurities (nickel, carbon, etc) were found to be relatively high (10[superscript]19 cm[superscript]-3 for carbon) as measured by secondary ion mass spectrometry (SIMS) and elemental analysis by energy dispersive x-ray spectroscopy (EDS). The boron arsenide crystals were found to have favorable electrical properties (μ = 24.5 cm[superscript]2 / Vs), but no interaction between a prototype detector and an alpha particle bombardment was observed. Thus, the flux growth method is viable for growing large B[subscript]12As[subscript]2 crystals, but the impurity concentrations remain a problem.
2

Epitaxial growth of icosahedral boron arsenide on silicon carbide substrates: improved process conditions and electrical properties

Zhang, Yi January 1900 (has links)
Doctor of Philosophy / Department of Chemical Engineering / James H. Edgar / The exceptional radiation resistance, high melting point, and wide energy bandgap (3.2 eV) of icosahedral boron arsenide, B[subscript]12As[subscript]2, make it an attractive candidate for applications in radiation intense environments, for example, in radioisotope batteries. These devices have potential lifetimes of decades rather than days or weeks that are typical of conventional chemical power cells. Solid state neutron detectors are another potential application of this semiconductor, as the boron-10 isotope has a high thermal neutron capture cross-section, orders of magnitude higher than most elements. To produce high quality crystalline B[subscript]12As[subscript]2 for these applications, this research focused on the epitaxy and electrical properties of B[subscript]12As[subscript]2 thin films. The major findings include the following. Twin-free heteroepitaxial B[subscript]12As[subscript]2 layers were obtained on m-plane 15R-SiC and c-plane 4H-SiC inclined 4° and 7° off-axis in the [1-100] direction. These substrates exposed asymmetric step-terrace surface structures that force B[subscript]12As[subscript]2 layers to adopt a single orientation, thus, twins were eliminated. Consequently, the crystal quality was greatly improved over films on on-axis c-plane 6H-SiC, yielding a maximum hole mobility of 80 cm[superscript]2V[superscript]-1s[superscript]-1, nearly 100 times higher than previously reported values. B[subscript]12As[subscript]2 epilayers grown at 1300°C had the lowest defect densities, smallest residual strains, highest mobility and highest deposition rate. Excess AsH[subscript]3 concentration was advantageous to prevent the loss of arsenic from the epilayer. Undoped B[subscript]12As[subscript]2 exhibited a variable-range-hopping conduction, indicating it was a highly disordered system. All films were p-type with a room temperature hole concentration on the order of 10[superscript]12~10[superscript]15cm[superscript]-3. The thermal activation energy of acceptors varied from 0.15 eV to 0.33 eV. The Hall mobility was dominated by impurity scattering at low temperatures and by polar phonon scattering at high temperatures. H, C, O and Si were the major impurities present in the undoped B[subscript]12As[subscript]2 films with concentrations on the order of 10[superscript]18~10[superscript]19 cm[superscript]-3. Si doping and annealing decreased the resistivity by up to two orders of magnitude. The density of localized states was small in the undoped B[subscript]12As[subscript]2 as the intrinsic acceptor levels (IALs) were compensated by the boron interstitials. However, in Si-doped B[subscript]12As[subscript]2, Si may prevent the interstitial boron atoms from compensating the IALs, yielding a decreased density of localized states. The Hall mobility of B[subscript]12As[subscript]2 epilayer was significantly reduced with increasing silicon concentration.
3

Main group semiconducting materials : boron arsenide and an ester-functionalized salophen aluminum polymer

Swingle, Sarah Faye 12 September 2013 (has links)
Boron arsenide is a compound main group semiconductor with a theoretical band gap in the range of 1.1 to 1.6 eV. Despite this ideal band gap, experimental studies of boron arsenide are very limited. In the present work, single source precursors with covalent bonds between boron and arsenic and labile ligands have been designed and synthesized. These precursors underwent thermal or chemical treatment to produce boron arsenide materials. Boron arsenide has also been prepared as a thin layer deposited on a boron substrate and a p-type photoelectrode was prepared from this material. The structure of the product was identified on the basis of X-ray diffraction and scanning electron microscopy, and the surface composition was determined by means of X-ray photoelectron spectroscopy. The electrode was found to be photoactive under both visible and UV-visible light irradiation and displayed a photocurrent of approximately 0.1 mA/cm² under UV-visible light irradiation at an applied potential of -0.25 V vs. Ag/AgCl. The valence band was estimated to be -5.1 eV. The indirect band gap, as determined from incident photo-to-electron conversion efficiency plots, is 1.46 eV. An ester-fuctionalized salophen aluminum complex that features a polymerizable bithiophene as the ester R group has been designed and synthesized. Metallopolymers of this type offer the additional advantages of processability and uniformity of the resulting films. The new salophen complex exhibited emission in the blue region at 491 nm with a quantum yield of 8.19%, which is significantly larger than that of the isolated ligand. Electropolymerization of this complex on a platinum button electrode resulted in the formation of an electrically conductive polymer that is also ionically conductive at low scan rates. In the polymeric form, the emission wavelength was found to be red-shifted to 505 nm. / text

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