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Implementation of Transport Module Controller And Remote Control System of Cluster ToolChen, Chia-Hung 03 September 2001 (has links)
none
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OPTIMAL PREVENTIVE MAINTENANCE SCHEDULING IN SEMICONDUCTOR FABSCRABTREE, JASON PAUL 02 September 2003 (has links)
No description available.
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Cluster tool for in situ processing and comprehensive characterization of thin films at high temperaturesWenisch, R., Lungwitz, F., Hanf, D., Heller, R., Zscharschuch, J., Hübner, R., von Borany, J., Abrasonis, G., Gemming, S., Escobar-Galindo, R., Krause, M. 07 May 2019 (has links)
A new cluster tool for in situ real-time processing and depth-resolved compositional, structural and optical characterization of thin films at temperatures from -100 to 800 °C is described. The implemented techniques comprise magnetron sputtering, ion irradiation, Rutherford backscattering spectrometry, Raman spectroscopy and spectroscopic ellipsometry. The capability of the cluster tool is demonstrated for a layer stack MgO/ amorphous Si (~60 nm)/ Ag (~30 nm), deposited at room temperature and crystallized with partial layer exchange by heating up to 650°C. Its initial and final composition, stacking order and structure were monitored in situ in real time and a reaction progress was defined as a function of time and temperature.
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