Manufacturing process development is under constant pressure to achieve a good yield for stable processes. The development of new technologies, especially in the field of photomask and semiconductor development, is at its phys- ical limits. In this area, data, e.g. sensor data, has to be collected and analyzed for each process in order to ensure process quality. With increasing complexity of manufactur- ing processes, the volume of data that has to be evaluated rises accordingly. The complexity and data volume exceeds the possibility of a manual data analysis. At this point, data mining techniques become interesting. The application of current techniques is complex because most of the data is captured with sensor measurement tools. Therefore, every measured value contains a specific error. In this paper we propose an error-aware extension of the density-based al- gorithm DBSCAN. Furthermore, we present some quality measures which could be utilized for further interpretation of the determined clustering results. With this new cluster algorithm, we can ensure that masks are classified into the correct cluster with respect to the measurement errors, thus ensuring a more likely correlation between the masks.