No description available.

<p>This thesis addresses the subject of diffractive axicons inpartially coherent or oblique illumination. Design andcharacterization of the axicons are performed using asymptoticwave optics, employing the stationary-phase method to obtainapproximations of the diffraction integrals.</p><p>A design method for axicons in partially coherentillumination is derived. The method can be applied to anyincident illumination on radially symmetric Schell-model form.It provides analytical solutions for some specific cases, butfor most incident intensity and coherence distributions it canbe solved numerically to yield the desired on-axis intensity.In addition, a method for estimating the width of the focalline is provided. For coherent light, the design method isidentical to the old one based on energy conservation in raybundles. Since the new method is derived entirely from waveoptics, it both clarifies the old method and extends it topartially coherent light.</p><p>Oblique illumination of axicons, frequently encountered inapplications, causes degradation of the focal line. This changeis characterized, and from the asymptotic theory it is foundthat the focal line is described by an asteroid curve. Thewidth of the focal segment in oblique illumination isaccurately predicted, as confirmed by simulations andexperiments. It is also found that at a fixed angle, anelliptical axicon may be used to compensate for the adverseeffects of oblique illumination.</p><p><b>Keywords:</b>axicons, diffractive optics, coherence,asymptotic methods</p>

Three types of focused ion beam machine: focused ion beam milling (FIB milling), focused ion beam lithography (FIB lithography), and focused ion beam direct deposition (FIB deposition), are described in detail to compare with electron beam lithography (EBL) and laser beam direct writing (LBW). A diffractive optical element (DOE) with continuous relief, six-annulus, relief depth of 1.17µm, and diameter of 65 µm, fabricated by use of the FIB milling, is cited as an example to illustrate the FIB milling and the comparison with the EBL and the LBW. Micro-cylindrical lens with dimension of 2.8µm×7.5µm×0.95µm in width, length and height, NA=0.2, is given as another fabrication example to illustrate the FIB deposition, which is a unique function for all the direct writing methods. They are all superiors to the EBL and the LBW in the case that optical elements need to be directly fabricated in local area of a device. / Singapore-MIT Alliance (SMA)

No description available.

This thesis addresses the subject of diffractive axicons inpartially coherent or oblique illumination. Design andcharacterization of the axicons are performed using asymptoticwave optics, employing the stationary-phase method to obtainapproximations of the diffraction integrals. A design method for axicons in partially coherentillumination is derived. The method can be applied to anyincident illumination on radially symmetric Schell-model form.It provides analytical solutions for some specific cases, butfor most incident intensity and coherence distributions it canbe solved numerically to yield the desired on-axis intensity.In addition, a method for estimating the width of the focalline is provided. For coherent light, the design method isidentical to the old one based on energy conservation in raybundles. Since the new method is derived entirely from waveoptics, it both clarifies the old method and extends it topartially coherent light. Oblique illumination of axicons, frequently encountered inapplications, causes degradation of the focal line. This changeis characterized, and from the asymptotic theory it is foundthat the focal line is described by an asteroid curve. Thewidth of the focal segment in oblique illumination isaccurately predicted, as confirmed by simulations andexperiments. It is also found that at a fixed angle, anelliptical axicon may be used to compensate for the adverseeffects of oblique illumination. Keywords:axicons, diffractive optics, coherence,asymptotic methods / NR 20140805

The inverse design of optical devices that exhibit desired functionalities as well as the solution of complex inverse problems are becoming essential research directions in modern optical engineering. Recent advancements in computation algorithms, machine learning architectures and optimization methods offer efficient means to deal with complex photonics problems with a large number of degrees of freedom. In this thesis, I present our work on developing an integrated framework for the inverse design of diffractive optical elements and nanophotonic media with tailored optical responses. In the first part of our work, we introduce the design of single-layer diffractive optical devices that extend conventional imaging functions to include dual-band multi-focal microlenses for multi-band imaging, modulated axilenses for ultracompact spectrometers, and hyperuniform phase plates for lensless imaging systems. We design these diffractive elements based on Rayleigh-Sommerfeld scalar diffraction simulations. We also fabricate them using scalable lithography and experimentally characterize their predicted diffraction and imaging performances. While we successfully validated our designs, we also identified the fundamental limitations and challenges of single-layer diffractive devices. In order to address these problems, in the second part of the work we introduce a novel and flexible approach for the inverse design of diffractive optical elements based on adaptive deep diffractive neural networks (a-D2NNs). In particular, we demonstrate two-layer dual-band multi-focal devices that exceed the efficiency limit of traditional single-layer devices and we leverage the powerful a-D2NN inverse design platform to engineer systems with targeted spectral lineshapes and focusing point-spread functions. Moreover, we apply a-D2NNs to the inverse design of ultracompact spectrometers and demonstrate nanometer-range spectral resolution for 100 micron-size devices that can be fabricated using conventional lithographic procedures. Finally, we apply the a-D2NNs approach to the design of hyperuniform scalar random fields that we have introduced as novel lensless imaging systems with modulated transfer functions that produce enhanced image quality compared to state-of-the-art phase plates based on the Perlin noise. We additionally show that a-D2NNs can be used to efficiently design different classes of hyperuniform random media that are currently being explored for a number of optical applications. In the third part of my thesis, we propose and develop a deep learning framework for solving inverse photonics problems by employing physics-informed neural networks (PINNs). We solve the non-local effective medium problem for finite-size metamaterials and address losses and radiation effects. Furthermore, we apply PINNs to solve the invisible cloaking inverse problem beyond the quasi-static limit. Finally, we develop a general PINN framework for inverse retrieval of optical parameters based on near-field data information. Based on our approach, we show the successful retrieval of the electric and magnetic optical parameters (i.e., non-local permittivity and permeability functions) of two-dimensional and three-dimensional scatterers in the presence of absorption losses. Additionally, we demonstrate the application of the inverse PINN design to the scanning near-field microscopy technique under localized excitation and in the presence of noise. In the last part of our work, we couple adjoint optimization methods with the rigorous multiple scattering theory of cylinder arrays (i.e., two-dimensional generalized Mie theory) for the inverse design of small-size, photonic structures, called “photonic patches”, that achieve different functionalities with optimal efficiencies. Specifically, we present the inverse design of photonic patches that angularly shape incoming radiation and that focus light intensity over Fresnel-zone distances (~ 10μm) with engineered spectral lineshapes, enhanced local density of states and resonance quality factors.

Neste projeto foram desenvolvidos elementos ópticos difrativos fabricados em vidro óptico com modulação de fase, elementos fabricados em silício e em Diamond Like Carbon (carbono tipo diamante) com modulação completa de fase e amplitude. O vidro óptico começa a transmitir em 277 nm (ultravioleta) e vai até o infravermelho próximo (2200 nm) da mesma maneira que o Diamond Like Carbon (que começa a transmitir em 330 nm). Já o silício é um material que começa a transmitir no infravermelho próximo (em torno de 980 nm) e vai até o infravermelho médio (16000 nm). Tanto para o Diamond Like Carbon como para o vidro óptico, optou-se por desenvolver dispositivos que operem para um comprimento de onda de 632,8 nm. Já os elementos ópticos difrativos baseados em silício foram fabricados para operar em 2 comprimentos de onda: 1550 nm e 10600 nm. Para os dispositivos fabricados, foram utilizadas etapas de limpeza de substrato, de deposição de filmes, de litografia e de corrosão úmida e por plasma. A etapa de corrosão por plasma foi o principal objeto de estudo do processo de fabricação com o intuito de otmilizá-la. Foram feitos estudos de taxa de corrosão dos materiais com diferentes composições gasosas com a finalidade de se encontrar os parâmetros mais adequados para otimizar a fabricação dos dispositivos. As melhores condições de processo para o vidro corroído com plasma de CF4 são pressão de 100 mTorr e potência de 400 W, para o Diamond Like Carbon corroído com plasma de O2, pressão de 25 mTorr e potência de 50 W e para o silício corroído com plasma de SF6 os parâmetros são pressão de 100 mTorr e potência de 150 W. Análises ópticas dos elementos, fabricados com esses processos foram realizadas. Na análise óptica dos dispositivos de vidro com dois e quatro níveis de modulação de fase ficou evidente que os elementos ópticos apresentaram bom desempenho devido à uniformidade da intensidade da luz projetada nas imagens e da baixa intensidade do ponto de ordem zero, além das imagens estarem bem focadas e definidas. Para os dispositivos fabricados em Diamond Like Carbon foram formadas imagens bem definidas e focadas. Em uma análise óptica da rugosidade RMS dos filmes finos de Diamond Like Carbon através da obtenção da Reflectância Total e da Reflectância Difusa, foi encontrado um valor de 18,8 nm, o qual se encontra bem abaixo do limite de 63 nm, o que faz com que o dispositivo gere uma imagem otimizada. / In this project it has been manufactured diffractive optical elements in three materials, optical glass, Diamond Like Carbon (DLC) and silicon. These elements were applied in phase modulation devices. The extra advantage of silicon and DLC were the amplitude modulation in visible and ultra-violet spectra respectively. The optic glass starts to transmit at the wavelength 277 nm (UV light) and goes till the near infrared in the same way that the Diamond Like Carbon (that starts to transmit in 330 nm). Silicon is a material that starts to transmit in the near infrared (980 nm) and goes till the middle infrared (16000 nm). Both, DLC and optic glass, was opted to developing devices that operate for a 632,8 nm wavelength. Diffractive Optical Elements silicon based had been manufactured to operate in two wavelengths: 1550 nm and 10600 nm. For the manufactured diffractive optical elements, were used process stages of substrate cleanness, films deposition, lithography and hybrid wet and dry plasma etching. The plasma etching stage was the most studied manufacturing process, aiming of optimized it. For this, some studies of materials etching rate with different gases were made with the purpose to find the more adequate parameters of Radio Frequency power and pressure to reduce the process time to obtain the necessary thickness and low surface roughness. The best conditions of plasma etching process were 100 mTorr pressure and Radio Frequency power of 400 W for the glass, 25 mTorr pressure and Radio Frequency power 50 W for the Diamond Like Carbon and the parameters are 100 mTorr pressure and Radio Frequency power 150 W for silicon. Optical analyses of the diffractive optical elements manufactured with these processes had been realized. In the optical analysis of the glass devices with two and four levels of phase modulation was evident that the optic elements had good performance due to uniformity of the projected light intensity in the images and low intensity of the zero order spot, as well the images are focused and defined. For elements manufactured in Diamond Like Carbon, defined and well-focused images had been formed. In an optic analysis of Diamond Like Carbon thin films RMS roughness through the Total Reflectance and the Diffuse Reflectance, was found a value of 18,8 nm roughness, which is below 63 nm limit, what do that the EOD generates an optimized image.

Neste projeto foram desenvolvidos elementos ópticos difrativos fabricados em vidro óptico com modulação de fase, elementos fabricados em silício e em Diamond Like Carbon (carbono tipo diamante) com modulação completa de fase e amplitude. O vidro óptico começa a transmitir em 277 nm (ultravioleta) e vai até o infravermelho próximo (2200 nm) da mesma maneira que o Diamond Like Carbon (que começa a transmitir em 330 nm). Já o silício é um material que começa a transmitir no infravermelho próximo (em torno de 980 nm) e vai até o infravermelho médio (16000 nm). Tanto para o Diamond Like Carbon como para o vidro óptico, optou-se por desenvolver dispositivos que operem para um comprimento de onda de 632,8 nm. Já os elementos ópticos difrativos baseados em silício foram fabricados para operar em 2 comprimentos de onda: 1550 nm e 10600 nm. Para os dispositivos fabricados, foram utilizadas etapas de limpeza de substrato, de deposição de filmes, de litografia e de corrosão úmida e por plasma. A etapa de corrosão por plasma foi o principal objeto de estudo do processo de fabricação com o intuito de otmilizá-la. Foram feitos estudos de taxa de corrosão dos materiais com diferentes composições gasosas com a finalidade de se encontrar os parâmetros mais adequados para otimizar a fabricação dos dispositivos. As melhores condições de processo para o vidro corroído com plasma de CF4 são pressão de 100 mTorr e potência de 400 W, para o Diamond Like Carbon corroído com plasma de O2, pressão de 25 mTorr e potência de 50 W e para o silício corroído com plasma de SF6 os parâmetros são pressão de 100 mTorr e potência de 150 W. Análises ópticas dos elementos, fabricados com esses processos foram realizadas. Na análise óptica dos dispositivos de vidro com dois e quatro níveis de modulação de fase ficou evidente que os elementos ópticos apresentaram bom desempenho devido à uniformidade da intensidade da luz projetada nas imagens e da baixa intensidade do ponto de ordem zero, além das imagens estarem bem focadas e definidas. Para os dispositivos fabricados em Diamond Like Carbon foram formadas imagens bem definidas e focadas. Em uma análise óptica da rugosidade RMS dos filmes finos de Diamond Like Carbon através da obtenção da Reflectância Total e da Reflectância Difusa, foi encontrado um valor de 18,8 nm, o qual se encontra bem abaixo do limite de 63 nm, o que faz com que o dispositivo gere uma imagem otimizada. / In this project it has been manufactured diffractive optical elements in three materials, optical glass, Diamond Like Carbon (DLC) and silicon. These elements were applied in phase modulation devices. The extra advantage of silicon and DLC were the amplitude modulation in visible and ultra-violet spectra respectively. The optic glass starts to transmit at the wavelength 277 nm (UV light) and goes till the near infrared in the same way that the Diamond Like Carbon (that starts to transmit in 330 nm). Silicon is a material that starts to transmit in the near infrared (980 nm) and goes till the middle infrared (16000 nm). Both, DLC and optic glass, was opted to developing devices that operate for a 632,8 nm wavelength. Diffractive Optical Elements silicon based had been manufactured to operate in two wavelengths: 1550 nm and 10600 nm. For the manufactured diffractive optical elements, were used process stages of substrate cleanness, films deposition, lithography and hybrid wet and dry plasma etching. The plasma etching stage was the most studied manufacturing process, aiming of optimized it. For this, some studies of materials etching rate with different gases were made with the purpose to find the more adequate parameters of Radio Frequency power and pressure to reduce the process time to obtain the necessary thickness and low surface roughness. The best conditions of plasma etching process were 100 mTorr pressure and Radio Frequency power of 400 W for the glass, 25 mTorr pressure and Radio Frequency power 50 W for the Diamond Like Carbon and the parameters are 100 mTorr pressure and Radio Frequency power 150 W for silicon. Optical analyses of the diffractive optical elements manufactured with these processes had been realized. In the optical analysis of the glass devices with two and four levels of phase modulation was evident that the optic elements had good performance due to uniformity of the projected light intensity in the images and low intensity of the zero order spot, as well the images are focused and defined. For elements manufactured in Diamond Like Carbon, defined and well-focused images had been formed. In an optic analysis of Diamond Like Carbon thin films RMS roughness through the Total Reflectance and the Diffuse Reflectance, was found a value of 18,8 nm roughness, which is below 63 nm limit, what do that the EOD generates an optimized image.

This dissertation investigates the monolithic integration of dual optical elements on high power semiconductor lasers for emission around 980nm wavelength. In the proposed configuration, light is coupled out of the AlGaAs/GaAs waveguide by a low reflectivity grating coupler towards the substrate where a second monolithic optical element is integrated to improve the device performance or functionality. A fabrication process based on electron beam lithography and plasma etching was developed to control the grating coupler duty cycle and shape. The near-field intensity profile outcoupled by the grating is modeled using a combination of finite-difference time domain (FDTD) analysis of the nonuniform grating and a self-consistent model of the broad area active region. Improvement of the near-field intensity profile in good agreement with the FDTD model is demonstrated by varying the duty cycle from 20% to 55% and including the aspect ratio dependent etching (ARDE) for sub-micron features. The grating diffraction efficiency is estimated to be higher than 95% using a detailed analysis of the losses mechanisms of the device. The grating reflectivity is estimated to be as low as 2.10-4. The low reflectivity of the light extraction process is shown to increase the device efficiency and efficiently suppress lasing oscillations if both cleaved facets are replaced by grating couplers to produce 1.5W QCW with 11nm bandwidth into a single spot a few mm above the device. Peak power in excess of 30W without visible COMD is achieved in this case. Having optimized, the light extraction process, we demonstrate the integration of three different optical functions on the substrate of the surface-emitting laser. First, a 40 level refractive microlens milled using focused ion beam shows a twofold reduction of the full-width half maximum 1mm above the device, showing potential for monolithic integration of coupling optics on the wafer. We then show that differential quantum efficiency of 65%, the highest reported for a grating-coupled device, can be achieved by lowering the substrate reflectivity using a 200nm period tapered subwavelength grating that has a grating wavevector oriented parallel to the electric field polarization. The low reflectivity structure shows trapezoidal sidewall profiles obtained using a soft mask erosion technique in a single etching step. Finally, we demonstrate that, unlike typical methods reported so far for in-plane beam-shaping of laser diodes, the integration of a beam-splitting element on the device substrate does not affect the device efficiency. The proposed device configuration can be tailored to satisfy a wide range of applications including high power pump lasers, superluminescent diodes, or optical amplifiers applications.

No description available.