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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.

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Aluminum and Copper Chemical Vapor Deposition on Fluoropolymer Dielectrics and Subsequent Interfacial Interactions

Sutcliffe, Ronald David 12 1900 (has links)
This study is an investigation of the chemical vapor deposition (CVD) of aluminum and copper on fluoropolymer surfaces and the subsequent interfacial interactions.
chemical vapor deposition
aluminum
copper
fluoropolymer surfaces
interfacial interactions
Vapor-plating.
Aluminum.
Copper.
Dielectric films.
Polymers -- Surfaces.

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