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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
1

Ultra-Wideband Transceiver with Error Correction for Cortical Interfaces in NanometerCMOS Process

Luo, Yi 01 May 2017 (has links)
This dissertation reports a high-speed wideband wireless transmission solution for the tight power constraints of cortical interface application. The proposed system deploysImpulse Radio Ultra-wideband (IR-UWB) technique to achieve very high-rate communication. However, impulse radio signals suffer from significant attenuation within the body,and power limitations force the use of very low-power receiver circuits which introduce additional noise and jitter. Moreover, the coils’ self-resonance has to be suppressed to minimize the pulse distortion and inter-symbol interference, adding significant attenuation. To compensate these losses, an Error correction code (ECC) layer is added for functioning reliably to the system. The performance evaluation is made by modeling a pair of physically fabricated coils, and the results show that the ECC is essential to obtain the system’s reliability. Furthermore, the gm/ID methodology, which is based on the complete exploration ofall inversion regions that the transistors are biased, is studied and explored for optimizingthe system at the circuit-level. Specific focuses are on the RF blocks: the low noise am-plifier (LNA) and the injection-locked voltage controlled oscillator (IL-VCO). Through the analytical deduction of the circuit’s features as the function of the gm/ID for each transistor, it is possible to select the optimum operating region for the circuit to achieve the target specification. Other circuit blocks, including the phase shifter, frequency divider,mixer, etc. are also described and analyzed. The prototype is fabricated in a 65-nm CMOS(Complementary Metal-Oxide-Semiconductor) process.

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