This article corrects the following: 'Origin of Ferroelectric Phase in Undoped HfO2 Films Deposited by Sputtering' Advanced Materials Interfaces 6(11) 2019, first Published online: April 29, 2019

The ferroelectricity in fluorite oxides has gained increasing interest due to its promising properties for multiple applications in semiconductor as well as energy devices. The structural origin of the unexpected ferroelectricity is now believed to be the formation of a non-centrosymmetric orthorhombic phase with the space group of Pca2₁. However, the factors driving the formation of the ferroelectric phase are still under debate. In this study, to understand the effect of annealing temperature, the crystallization process of doped HfO₂ thin films is analyzed using in situ, high-temperature X-ray diffraction. The change in phase fractions in a multiphase system accompanied with the unit cell volume increase during annealing could be directly observed from X-ray diffraction analyses, and the observations give an information toward understanding the effect of annealing temperature on the structure and electrical properties. A strong coupling between the structure and the electrical properties is reconfirmed from this result.