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Growth and Characterization of Thin MoS2 Layers by CVDNordheim, Gregor 24 June 2024 (has links)
The contribution describes the construction of a CVD system, the deposition of thin molybdenum disulphide layers using this system and the analysis of the samples produced. The deposition of thin molybdenum disulphide layers and an intercalation of the silicon carbide substrate used were demonstrated and the measurement results obtained by atomic force microscopy and photoelectron spectroscopy were further discussed.
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