In this thesis, we will try to grow m-plane InGaN blue light-emitting diodes (LEDs) and discuss the characteristics. First, pure m-plane GaN on the m-sapphire grown by plasma assisted molecular beam epitaxy (PAMBE) had been achieved. ¢½/¢» ratio and the growth temperature are the most important factors in the growth sequence. M-GaN film with better crystal quality was grown successfully by tuning these two factors. Indium composition in the InGaN layer is an important issue in the growth of blue LEDs; In/Ga ratio could affect the bandgap i.e. the target wavelength of a LED. We have to regard the crystal quality and the target wavelength of the InGaN layer in growth procedure. Structural properties were investigated by X-ray diffraction (XRD). XRD measurements showed that the crystal orientation of GaN films was pure m-plane. From cathodoluminescence (CL) spectra, the luminescence wavelength of InGaN layer is in the blue-light range. The crysatalline of m-plane InGaN blue LEDs were analyzed by XRD and Electron Back-Scattered Diffraction (EBSD). Electroluminescence (EL) was measured under the different inject current conditions; the polarization of EL was also measured. Moreover, the current-voltage curve and current-output curve were carried out.