Decades of efforts have pushed the replacement of electrical interconnects by optical links to the interconnects between computers, racks and circuit boards. It may be expected that optical solutions will further be used for inter-chip and intra-chip interconnects with potential benefits in bandwidth, capacity, delay, power consumption and crosstalk. Silicon integration is emerging to be the best candidate nowadays due to not only the dominant status of silicon in microelectronics but also the great advantages brought to the photonic integrated circuits (PICs). Regarding the recent breakthroughs concerning active devices on silicon substrate, the question left is no longer the feasibility of the optical interconnects based on silicon but the competitiveness of the silicon device compared with other alternatives. This thesis focuses on the study of two key components for the optical interconnects, both especially designed and fabricated for silicon platform. One is a high speed electroabsorption modulator (EAM), realized by transferring an InP-based segmented design to the hybrid silicon evanescent platform. The purpose here is to increase the speed of the silicon PICs to over 50  Gb/s or more. The other one is a high performance grating coupler, with the purpose to improve the optical interface between the silicon PICs and the outside fiber-based communication system. An general approach based on the transmission line analysis has been developed to evaluate the modulation response of an EAM with a lumped, traveling-wave, segmented or capacitively-loaded configuration. A genetic algorithm is used to optimize its configuration. This method has been applied to the design of the EAMs on hybrid silicon evanescent platform. Based on the comparison of various electrode design, segmented configuration is adopted for the target of a bandwidth over 40 GHz with as low as possible voltage and high extinction ratio. In addition to the common periodic analysis, the grating coupler is analyzed by the antenna theory assisted with an improved volume-current method, where the directionality of a grating coupler can be obtained analytically. In order to improve the performance of the grating coupler, a direct way is to address its shortcoming by e.g. increasing the coupling efficiency. For this reason, a nonuniform grating coupler with apodized grooves has been developed with a coupling efficiency of 64%, nearly a double of a standard one. Another way is to add more functionalities to the grating coupler. To do this, a polarization beam splitter (PBS) based on a bidirectional grating coupler has been proposed and experimentally demonstrated. An extinction ratio of around -20 dB, as well as a maximum coupling efficiency of over 50% for both polarizations, is achieved by such a PBS with a Bragg reflector underneath. / QC 20100906

Current trends in electronic industry, such as Internet of Things (IoT) and Cloud Computing call for high interconnect bandwidth, increased number of active devices and high IO count. Hence the integration of on silicon optical waveguides becomes an alternative approach to cope with the performance demands. The application and fabrication of horizontal (planar) and vertical (Through Silicon Vias - TSVs) optical waveguides are discussed here. Coupling elements are used to connect both waveguide structures. Two micro-structuring technologies for integration of coupling elements are investigated: μ-mirror fabrication by nanoimprint (i) and dicing technique (ii). Nanoimprint technology creates highly precise horizontal waveguides with polymer (refractive index nC = 1.56 at 650 nm) as core. The waveguide ends in reflecting facets aligned to the optical TSVs. To achieve Total Internal Reflection (TIR), SiO2 (nCl = 1.46) is used as cladding. TSVs (diameter 20-40μm in 200-380μm interposer) are realized by BOSCH process1, oxidation and SU-8 filling techniques. To carry out the imprint, first a silicon structure is etched using a special plasma etching process. A polymer stamp is then created from the silicon template. Using this polymer stamp, SU-8 is imprinted aligned to vertical TSVs over Si surface.Waveguide dicing is presented as a second technology to create coupling elements on polymer waveguides. The reflecting mirror is created by 45° V-shaped dicing blade. The goal of this work is to develop coupling elements to aid 3D optical interconnect network on silicon interposer, to facilitate the realization of the emerging technologies for the upcoming years.

Current electrical systems are faced with the limitation in performance by the electrical interconnect technology determining overall processing speed. In addition, the electrical interconnects containing many long distance interconnects require high power to drive. One of the best ways to overcome these bottlenecks is through the use of optical interconnect to limit interconnect latency and power. This research explores new computer-aided design algorithms for developing optoelectronic systems. These algorithms focus on place and route problems using optical interconnections covering system-on-a-chip design as well as system-on-a-package design. In order to design optoelectronic systems, optical interconnection models are developed at first. The CAD algorithms include optical interconnection models and solve place and route problems for optoelectronic systems. The MCNC and GSRC benchmark circuits are used to evaluate these algorithms.