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Development of photocurable pillar arrays formed via electrohydrodynamic instabilitiesDickey, Michael David, January 1900 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2006. / Vita. Includes bibliographical references.
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Design, synthesis and testing of materials for 157 nm photolithographyChambers, Charles Ray 28 August 2008 (has links)
Not available / text
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Design and synthesis of materials for 157 nm photoresists applicationsPinnow, Matthew James 28 August 2008 (has links)
Not available / text
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Photolithography Patterning of Complementary Organic CircuitsIsmail, Ahmad G. 20 April 2011 (has links)
The application of organic electronics to display technologies, large area electronic paper
(or plastics), organic light emitting diodes (OLEDs), organic solar cells, radio frequency
identification tags, smart cards and chemical sensors has received a great deal of attention
in recent years. The main advantages of using organic semiconductors (OSCs) are lowcost,
low processing temperature, flexibility, light weight and rugged design. The
substantial progress in this field has been driven not just by existing technologies, such as
flat panel displays, but also by new applications, such as flexible solid-state lighting, lowcost
printed integrated circuits, and plastic solar cells, to name a few.
Performance-wise, organic thin-film transistors (OTFTs) are on par with their a-Si
(amorphous silicon) counterparts. Since OTFT fabrication offers lower processing
temperatures and lower cost, it has the potential to replace a-Si in the near future. To
date, all organic complementary circuits have used stencil mask patterning. Stencil mask
patterning is not practical for mass manufacturing; hence, a way to pattern organic
complementary metal-oxide-semiconductor (O-CMOS) using photolithography is
paramount. This is the goal of this thesis. In this dissertation the design and fabrication
of improved OTFTs for electronic displays and complementary circuits are illustrated.
Here, we demonstrated OTFTs that have excellent stability; hence, they are more suitable
for the above-mentioned electronic applications. In addition, for the first time, successful
photolithographic patterning of an n-channel organic semiconductor is demonstrated.
These important results have enabled us to integrate the n-channel and p-channel organic
materials using a complete photolithographic process in realizing O-CMOS.
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The fabrication of PBCO buffered step-edge Josephson junctions /Van Staden, Wynand Fourie. January 2007 (has links)
Thesis (MScIng)--University of Stellenbosch, 2007. / Bibliography. Also available via the Internet.
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Evaluation of SU8 and ruthenium oxide materials for microfluidic devicesAudrain, Margaret T. January 2008 (has links) (PDF)
Thesis (M.S.)--Missouri University of Science and Technology, 2008. / Vita. The entire thesis text is included in file. Title from title screen of thesis/dissertation PDF file (viewed August 15, 2008) Includes bibliographical references.
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Black & white continuous tone printing using multiple negative working plates, so that each plate prints an equal segment of a determined density range /Forti, Frank C. January 1986 (has links)
Thesis (M.S.)--Rochester Institute of Technology, 1986. / Six plates are illustrations of press runs. Typescript. Includes bibliographical references (leaf 43).
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Effects of exposure on the printing characteristics of the association product process /Davis, Claude David. January 1988 (has links)
Thesis (M.S.)--Rochester Institute of Technology, 1988. / Typescript. Includes bibliographical references (leaves 63-65).
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Lateral resolution in laser induced forward transferWang, Qing. January 2009 (has links)
Thesis (M.Sc.)--University of Alberta, 2009. / Title from PDF file main screen (viewed on Mar. 25, 2010). A thesis submitted to the Faculty of Graduate Studies and Research in partial fulfillment of the requirements for the degree of Master of Science, Department of Electrical and Computer Engineering, University of Alberta. Includes bibliographical references.
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Exploration of non-chemically amplified resists based on dissolution inhibitors for 193 nm lithography /Baylav, Burak. January 2010 (has links)
Thesis (M.S.)--Rochester Institute of Technology, 2010. / Typescript. Includes bibliographical references (leaves 45-47).
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