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Propriedades ópticas dos vidros Er3+:PbPO4 / Optical Properties of the Er3+:PbPO4 GlassesSantos, Clenilton Costa dos January 2010 (has links)
SANTOS, Clenilton Costa dos. Propriedades ópticas dos vidros Er3+:PbPO4. 2010. 96 f. Tese (Doutorado em Física) - Programa de Pós-Graduação em Física, Departamento de Física, Centro de Ciências, Universidade Federal do Ceará, Fortaleza, 2010. / Submitted by Edvander Pires (edvanderpires@gmail.com) on 2014-11-03T18:38:41Z
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Previous issue date: 2010 / In this work we employ several techniques to investigate the optical properties of moderately high Er3+-doped lead phosphate (EDLP) glasses. The third-order optical susceptibility, χ3, and dispersion of the linear refractive index, n0(λ), of Er3+:PbPO4 were measured in the wavelength range between 400 and 1940 nm by using the spectrally resolved femtosecond Maker fringes technique. The nonlinear refractive index, n2, obtained from the third-order susceptibility was found to be five times higher than that of silica. For comparison purposes, the Z-scan technique was also employed to obtain the values of n2 of EDLP at several wavelengths, and the values obtained using the two techniques agree to within 15%. From the data obtained by absorption measurements, the Judd-Ofelt theory was employed to calculate the intensity-dependent parameters Ωλ (λ = 2, 4, and 6). We observed that increasing Er3+ content, Ω4 and Ω6 remain constant, while Ω2 decreases. Green, red, and infrared emissions centered at 530, 550, 660, and 1530 nm were observed under excitation at 800 nm. The lifetime of the Er3+: 4I13/2 → 4I15/2 (1530 nm) transition decreases with increasing Er3+ content, reflecting how significant the non-radiative process associated with this transition is. The McCumber theory was used to calculate, from absorption cross-section, the stimulated emission cross-section of the Er3+: 4I13/2 → 4I15/2 transition. A strong re-absorption of the fluorescence at 1530 nm was also observed and analyzed. Finally, we discuss the potential use of Er3+:PbPO4 glasses in photonics devices. / Neste trabalho utilizamos várias técnicas para investigar as propriedades ópticas dos vidros fosfato de chumbo (PbPO4) com concentrações moderadamente altas de íons de érbio (Er3+), EDLP. Medimos a susceptibilidade de terceira ordem, χ3, e a dispersão do índice de refração linear, n0(λ), dos vidros EDLP na região de comprimento de onda entre 400 e 1940 nm, por meio da técnica de Franjas de Maker. A partir do valor de χ3, calculamos o índice de refração não-linear, n2, cujo valor é cerca de cinco vezes maior que o da sílica (SiO2). Também obtivemos os valores de n2 dos vidros EDLP, através da técnica de varredura Z para vários comprimentos de onda. A diferença entre os valores obtidos pelas duas técnicas foi de 15%. Realizamos medidas de absorção óptica, cujos dados foram utilizados para calcular os parâmetros fenomenológicos Ωλ da teoria de Judd-Ofelt. Observamos que Ω4 e Ω6 permanecem praticamente constante com o aumento da concentração de Er3+, ao passo que Ω2 diminui. Excitando as amostras em 800 nm foi possível verificar emissões no verde, vermelho e infravermelho, centradas em 530, 550, 660 e 1530 nm, respectivamente. O tempo de vida da transição 4I13/2 → 4I15/2 (em 1530 nm) do Er3+ diminui com o aumento da concentração de Er3+, refletindo o quão importante é o processo não-radiativo associado a esta transição. A teoria de McCumber foi usada para calcular, a partir da seção de choque de absorção, a seção de choque da emissão estimulada da transição 4I13/2 → 4I15/2 do Er3+. Observamos e analisamos uma forte reabsorção da fluorescência em 1530 nm. Finalmente, discutimos a aplicabilidade dos vidros EDLP em dispositivos fotônicos.
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Propriedades Ãpticas dos vidros Er3+:PbPO4 / Optical Properties of the Er3+:PbPO4 GlassesClenilton Costa dos Santos 02 July 2010 (has links)
CoordenaÃÃo de AperfeiÃoamento de Pessoal de NÃvel Superior / Neste trabalho utilizamos vÃrias tÃcnicas para investigar as propriedades Ãpticas dos vidros fosfato de chumbo (PbPO4) com concentraÃÃes moderadamente altas de Ãons de Ãrbio (Er3+), EDLP. Medimos a susceptibilidade de terceira ordem, χ3, e a dispersÃo do Ãndice de refraÃÃo linear, n0(λ), dos vidros EDLP na regiÃo de comprimento de onda entre 400 e 1940 nm, por meio da tÃcnica de Franjas de Maker. A partir do valor de χ3, calculamos o Ãndice de refraÃÃo nÃo-linear, n2, cujo valor à cerca de cinco vezes maior que o da sÃlica (SiO2). TambÃm obtivemos os valores de n2 dos vidros EDLP, atravÃs da tÃcnica de varredura Z para vÃrios comprimentos de onda. A diferenÃa entre os valores obtidos pelas duas tÃcnicas foi de 15%. Realizamos medidas de absorÃÃo Ãptica, cujos dados foram utilizados para calcular os parÃmetros fenomenolÃgicos Ωλ da teoria de Judd-Ofelt. Observamos que Ω4 e Ω6 permanecem praticamente constante com o aumento da concentraÃÃo de Er3+, ao passo que Ω2 diminui. Excitando as amostras em 800 nm foi possÃvel verificar emissÃes no verde, vermelho e infravermelho, centradas em 530, 550, 660 e 1530 nm, respectivamente. O tempo de vida da transiÃÃo 4I13/2 → 4I15/2 (em 1530 nm) do Er3+ diminui com o aumento da concentraÃÃo de Er3+, refletindo o quÃo importante à o processo nÃo-radiativo associado a esta transiÃÃo. A teoria de McCumber foi usada para calcular, a partir da seÃÃo de choque de absorÃÃo, a seÃÃo de choque da emissÃo estimulada da transiÃÃo 4I13/2 → 4I15/2 do Er3+. Observamos e analisamos uma forte reabsorÃÃo da fluorescÃncia em 1530 nm. Finalmente, discutimos a aplicabilidade dos vidros EDLP em dispositivos fotÃnicos. / In this work we employ several techniques to investigate the optical properties of moderately high Er3+-doped lead phosphate (EDLP) glasses. The third-order optical susceptibility, χ3, and dispersion of the linear refractive index, n0(λ), of Er3+:PbPO4 were measured in the wavelength range between 400 and 1940 nm by using the spectrally resolved femtosecond Maker fringes technique. The nonlinear refractive index, n2, obtained from the third-order susceptibility was found to be five times higher than that of silica. For comparison purposes, the Z-scan technique was also employed to obtain the values of n2 of EDLP at several wavelengths, and the values obtained using the two techniques agree to within 15%. From the data obtained by absorption measurements, the Judd-Ofelt theory was employed to calculate the intensity-dependent parameters Ωλ (λ = 2, 4, and 6). We observed that increasing Er3+ content, Ω4 and Ω6 remain constant, while Ω2 decreases. Green, red, and infrared emissions centered at 530, 550, 660, and 1530 nm were observed under excitation at 800 nm. The lifetime of the Er3+: 4I13/2 → 4I15/2 (1530 nm) transition decreases with increasing Er3+ content, reflecting how significant the non-radiative process associated with this transition is. The McCumber theory was used to calculate, from absorption cross-section, the stimulated emission cross-section of the Er3+: 4I13/2 → 4I15/2 transition. A strong re-absorption of the fluorescence at 1530 nm was also observed and analyzed. Finally, we discuss the potential use of Er3+:PbPO4 glasses in photonics devices.
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Thin Film Deposition on Powder Substrates using ALD and its Characterization using XPS, TEM, and SEShah, Dhruv 28 April 2020 (has links)
The major part of my dissertation consists of thin films deposited using atomic layer deposition on flat and powder substrates. It details the various optimization experiments for process parameters like dose time, purge time, temperature, and pressure on silicon shards and powder substrates. Spectroscopic ellipsometry (SE) was used to characterize these films over a wide wavelength range (191-1688 nm). An optical model with a BEMA (Bruggeman effective medium approximation) layer was used to fit the ellipsometric data to investigate the optical properties of the alumina surface. The optimized process parameters on the flat surfaces were used for coating powder substrates. I propose a set of experiments to optimize the conditions for coating of powders and high aspect ratio structures by atomic layer deposition (ALD). The coated powders were analyzed by surface analytical techniques like X-ray photoelectron spectroscopy, spectroscopic ellipsometry, transmission electron microscopy, energy X-ray dispersive spectroscopy (EDAX), and BET. The first chapter introduces the technique of atomic layer deposition, and details its advantages and limitations over conventional thin film deposition techniques like chemical vapor deposition and physical vapor deposition. The second chapter details the initial deposition experiments performed on flat surfaces and characterization of thin films using surface analytical tools. I conducted multi-sample analysis on eleven different thin films for calculation of optical constants of alumina. The third chapter introduces thin film deposition experiments performed on powder substrates, several challenges associated with achieving conformal thin films and characterization. The fourth chapter details the experiments to achieve unilateral ALD achieved on one side of the substrates. The fifth chapter details various unconventional materials including liquid water, Coca-Cola, a coffee bean, nitrogen gas, human tooth, and printed office paper, which were analyzed by near ambient pressure XPS (NAP-XPS). This dissertation contains appendices of other tutorial articles I wrote on obtaining optical constants liquid samples using spectroscopic ellipsometry, and good experimental techniques for maintenance of vacuum equipment.
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Thin Film Deposition on Powder Substrates using ALD and its Characterization using XPS, TEM, and SEShah, Dhruv 28 April 2020 (has links)
The major part of my dissertation consists of thin films deposited using atomic layer deposition on flat and powder substrates. It details the various optimization experiments for process parameters like dose time, purge time, temperature, and pressure on silicon shards and powder substrates. Spectroscopic ellipsometry (SE) was used to characterize these films over a wide wavelength range (191-1688 nm). An optical model with a BEMA (Bruggeman effective medium approximation) layer was used to fit the ellipsometric data to investigate the optical properties of the alumina surface. The optimized process parameters on the flat surfaces were used for coating powder substrates. I propose a set of experiments to optimize the conditions for coating of powders and high aspect ratio structures by atomic layer deposition (ALD). The coated powders were analyzed by surface analytical techniques like X-ray photoelectron spectroscopy, spectroscopic ellipsometry, transmission electron microscopy, energy X-ray dispersive spectroscopy (EDAX), and BET. The first chapter introduces the technique of atomic layer deposition, and details its advantages and limitations over conventional thin film deposition techniques like chemical vapor deposition and physical vapor deposition. The second chapter details the initial deposition experiments performed on flat surfaces and characterization of thin films using surface analytical tools. I conducted multi-sample analysis on eleven different thin films for calculation of optical constants of alumina. The third chapter introduces thin film deposition experiments performed on powder substrates, several challenges associated with achieving conformal thin films and characterization. The fourth chapter details the experiments to achieve unilateral ALD achieved on one side of the substrates. The fifth chapter details various unconventional materials including liquid water, Coca-Cola, a coffee bean, nitrogen gas, human tooth, and printed office paper, which were analyzed by near ambient pressure XPS (NAP-XPS). This dissertation contains appendices of other tutorial articles I wrote on obtaining optical constants liquid samples using spectroscopic ellipsometry, and good experimental techniques for maintenance of vacuum equipment.
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