The attenuated total reflection (ATR) method and the scattering spectrum analysis are used to study the effects due to the surface plasma of Ag nanoparticles. A slide is coated with a thin Ag film of thickness about 40nm and anneals the sample few minutes at 197¢XC. The Ag film is thus congregated to be a rough surface. By ATR(with the slide attached to the back of the prism), the intensity of the total refection light and the reflective angle are measured. Then we can determine the dielectric coefficient of the rough Ag surface. We also coat a thin Ag film about 8nm on the ITO glass and anneal the sample. The thin Ag film is thus congregated to be nanoparticles. We discuss the effects due to the surface plasma excited on the Ag nanoparticles by analyzing the absorbance and scattering spectrums from Ag nanoparticles in liquid crystals environment.

Abstract Negative index structures could be implemented through surface Plasmon polariton waves generated by nanostructures. We are interested in PMMA grating structure on curved metal surface. In order to fabricate this kind of samples, a series process parameters have been tested and also the lift-off process has been developed. Our results show superlens effect under optical microscope(OM). The sub-wavelength grating image is reconstructed in the non-grating region where the PMMA dielectric layer is not uniform. Surface Plasmon(SPP) waves generated in the grating region propagate to the non-grating region and are scattered out through the non-uniform PMMA layer. The grating information is not resolvable under OM but clear in the reconstructed region. It shows that SPP waves can show super resolution and a simple batch process should be developed in the future.

Diss. (sammanfattning) Linköping : Univ., 2001. / Härtill 6 uppsatser.

With the development of electricity transmission systems, more and more insulators have been used in the system to isolate the high potential conductors from the earth. In order to secure the reliability of power system, it is necessary to understand the ageing mechanism of the insulators. A model for energy (heat) transfer between low current discharges and insulation surfaces has been built in this project which contributes to the understanding and prediction of insulator ageing. Within the experimental work, the temperature of low current discharges under different conditions has been measured with the “Best-fit” method. The temperature was found to vary between 1200 K and 2300 K with current level, sub cycle duration, gap length, electrode conductivity and polarity of DC discharges. The discharge temperature increases with the growth of current and sub cycle duration by means of the elevation of energy, while the discharge temperature is hotter between salt water droplets than between tap water droplets even though the former has a lower energy (I^2 Rt). The temperature is insensitive to a change of gap length and a positive discharge has a higher temperature than an equivalent negative one. The specific measurement shows the middle part is hotter than the electrode areas. Within the simulation work, the presence of water droplet(s) on the insulation surface concentrates and enhances the electric field over the surface which increases the risk of partial discharge. For practical insulators, this means the core, rather than the sheds, suffers more from discharges between water droplets as they are aligned to the electric field. This highlights the importance of keeping the core dry. The simulation of heat transfer between low current discharges insulation surface was achieved using COMSOL software. The simulated results show that the surface temperature increases rapidly in the first few seconds and arrives at a thermal equilibrium state after 20 seconds of discharge, which meets the experimental observation. The insulation surface temperature distribution under AC discharge is symmetric and the surface centre has the highest temperature which decreases towards the water droplets. In DC, the surface around the cathode is the hottest and the anode area is the coldest.

Made available in DSpace on 2014-12-17T14:13:53Z (GMT). No. of bitstreams: 1 MarcoAMS_TESE.pdf: 4598195 bytes, checksum: 64f542a86c9a48f91e63fe82fc791428 (MD5) Previous issue date: 2013-10-08 / Recent years have seen a significant growth in surface modifications in titanium implants, resulting in shorter healing times in regions with low bone density. Among the different techniques, subtraction by chemical agents to increase oxidation has been applied for surface treatment of dental implants. However, this technique is generally unable to remove undesirable oxides, formed spontaneously during machining of titanium parts, raising costs due to additional decontamination stages. In order to solve this problem, the present study used plasma as an energy source to both remove these oxides and oxidize the titanium surface. In this respect, Ti disks were treated by hollow cathode discharge, using a variable DC power supply and vacuum system. Samples were previously submitted to a cleaning process using an atmosphere of Ar, H2 and a mixture of both, for 20 and 60 min. The most efficient cleaning condition was used for oxidation in a mixture of argon (60%) and oxygen (40%) until reaching a pressure of 2.2 mbar for 60 min at 500?C. Surfaces were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), atomic force microscopy (AFM), adhesion and cell proliferation. SEM showed less cell spreading and a larger number of projections orfilopodia in the treated samples compared to the control sample. AFM revealed surface defects in the treated samples, with varied geometry between peaks and valleys. Biological assays showed no significant difference in cell adhesion between treated surfaces and the control. With respect to cell proliferation, the treated surface exhibited improved performance when compared to the control sample. We concluded that the process was efficient in removing primary oxides as well as in oxidizing titanium surfaces / Nos ?ltimos anos, tem-se observado um crescimento nas modifica??es superficiais em implantes de tit?nio, que abrevia o tempo de cicatriza??o em regi?es com baixa densidade ?ssea. Dentre as diferentes t?cnicas, a de subtra??o por agentes qu?micos para aumentar a oxida??o vem sendo aplicada para tratamentos superficiais de implantes dentais. Por?m esta t?cnica geralmente n?o propicia a remo??o dos ?xidos indesej?veis formados espontaneamente durante a usinagem de pe?as de tit?nio, aumentando assim o custo, por exigir etapas adicionais para a descontamina??o. Com o objetivo de solucionar esse problema, utilizou-se neste trabalho o plasma como fonte energ?tica, tanto na remo??o desses ?xidos quanto como na oxida??o de superf?cie de tit?nio. Neste sentido, discos de Ti foram tratados em descarga por c?todo oco, usando-se uma fonte de tens?o DC vari?vel e sistema de v?cuo. Previamente, as amostras foram submetidas a processo de limpeza, utilizando-se atmosfera de Ar, H2 e mistura, em tempos de 20 e 60 min. A condi??o de limpeza mais eficaz foi utilizada para a oxida??o, numa mistura de arg?nio (60%) e oxig?nio (40%), at? atingir a press?o de 2,2 mbar durante 60 min, a 500?C. As superf?cies foram caracterizadas por microscopia eletr?nica de varredura (MEV), difra??o de raios X (DRX), microscopia por for?a at?mica (AFM), ades?o e prolifera??o celular. Na microscopia eletr?nica de varredura (MEV), observou-se um menor espraiamento celular e uma maior quantidade de proje??es ou filop?dios nas amostras tratadas, em compara??o ? amostra-controle. A microscopia de for?a at?mica (AFM) mostrou, nas amostras tratadas, defeitos nas superf?cies com geometria variada para picos e vales. Nos ensaios biol?gicos, houve diferen?as significativas na ades?o e prolifera??o celular, em que a superf?cie tratada apresentou um maior desempenho quando comparada com a amostra-controle.Concluiu-se que o processo foi eficiente tanto na remo??o dos ?xidos prim?rios quanto na oxida??o da superf?cie do tit?nio

Made available in DSpace on 2014-12-17T14:07:06Z (GMT). No. of bitstreams: 1 PolianaRFS_DISSERT.pdf: 3998823 bytes, checksum: e0480a4a5d6b04450e748434898535a9 (MD5) Previous issue date: 2013-03-01 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior / The technique of plasma nitriding by the cathode cage mainly stands out for its ability to produce uniform layers, even on parts with complex geometries. In this study, it was investigated the efficiency of this technique for obtaining duplex surface, when used, simultaneously, to nitriding treatment and thin film deposition at temperatures below 500?C. For this, were used samples of AISI 41 0 Martensitic Stainless Steel and performed plasma treatment, combining nitriding and deposition of thin films of Ti and/or TiN in a plasma atmosphere containing N2-H2. It was used a cathodic cage of titanium pure grade II, cylindrical with 70 mm diameter and 34 mm height. Samples were treated at temperature 420?C for 2 and 12 hours in different working pressures. Optical Microscopy (OM), Scanning Electron Microscopy (SEM) with micro-analysis by Energy Dispersive Spectroscopy (EDS), X-Ray Diffraction (XRD), Atomic Force Microscopy (AFM) and analysis of Vickers Microhardness were used to investigate coating properties such as homogeneity and surface topography, chemical composition, layer thickness, crystalline phase, roughness and surface microhardness. The results showed there is a direct proportionality between the presence of H2 in plasma atmosphere and the quantity of titanium in surface chemical composition. It was also observed that the plasma treatment at lowpressure is more effective in formation of TiN thin film / A t?cnica de nitreta??o a plasma por gaiola cat?dica vem se destacando, principalmente, pela sua capacidade de produzir camadas uniformes mesmo em pe?as com geometria complexa. Neste trabalho, investigou-se a efici?ncia desta t?cnica para obten??o de superf?cie duplex, quando utilizada, simultaneamente, para tratamento de nitreta??o e deposi??o de filmes finos em temperaturas inferiores a 500?C. Para tal, foram utilizadas amostras do a?o inoxid?vel martens?tico AISI 410 e realizados tratamentos a plasma, combinando a nitreta??o e deposi??o de filmes finos de Ti e/ou TiN, em uma atmosfera contendo N2-H2. Foi utilizada uma gaiola cat?dica de tit?nio puro grau II em forma cil?ndrica, com 70 mm de di?metro e 34 mm de altura. As amostras foram tratadas numa temperatura de 420?C, com dura??o de 2 e 12 horas e em diferentes press?es de trabalho. Microscopia ?ptica (MO), Microscopia Eletr?nica de Varredura (MEV) com microan?lise por Espectroscopia de Energia Dispersiva (EDS), Difra??o de Raios-X (DRX), Microscopia de For?a At?mica (MFA) e ensaio de Microdureza Vickers foram empregados para investigar as propriedades do revestimento, tais como homogeneidade e topografia superficial, composi??o qu?mica, espessura da camada, fases cristalinas, rugosidade e microdureza superficial. Os resultados mostraram existir uma proporcionalidade direta entre a presen?a de H2 na atmosfera do plasma e a quantidade do elemento qu?mico tit?nio na composi??o qu?mica superficial. Observou-se, tamb?m, que o tratamento a plasma em baixa press?o ? mais eficaz na forma??o do filme fino de nitreto de tit?nio