Thesis (M.Phil.)--Chinese University of Hong Kong. / Bibliography: leaves 211-214.

by KE Ning. / Thesis (Ph.D.)--Chinese University of Hong Kong, 1996. / Includes bibliographical references (leaves 127-134). / ACKNOWLEDGMENT --- p.a1 / ABSTRACT --- p.a2 / CONTENTS --- p.a3 / LIST OF FIGURE --- p.a6 / LIST OF TABLE --- p.a10 / Chapter CHAPTER 1 --- Introduction / Chapter 1.1 --- Overview of Some Carbon-Based Materials --- p.1 / Chapter 1.2 --- Diamond-Like Carbon (DLC) Thin Films --- p.3 / Chapter 1.2.1 --- Introduction --- p.3 / Chapter 1.2.2 --- Applications of DLC films --- p.9 / Chapter 1.2.3 --- The role of hydrogen --- p.10 / Chapter 1.2.4 --- The role of fluorine and the scope of this work --- p.13 / Chapter 1.3 --- Fullerenes --- p.17 / Chapter 1.3.1 --- Introduction --- p.17 / Chapter 1.3.2 --- Applications --- p.20 / Chapter 1.3.3 --- "The oxygen effect, the metal doping effect and the Scope of this study" --- p.23 / Chapter 1.4 --- Organization of This Thesis --- p.26 / Chapter CHAPTER 2 --- Experimental --- p.27 / Chapter 2.1 --- Samples Preparation and Thin Films Deposition --- p.27 / Chapter 2.1.1 --- Hydrogenated amorphous carbon thin film --- p.27 / Chapter 2.1.2 --- The fullerenes and C60 synthesis --- p.30 / Chapter 2.1.3 --- C60 thin film deposition --- p.34 / Chapter 2.2 --- Modification --- p.35 / Chapter 2.2.1 --- Ion implantation of a-C:H films --- p.35 / Chapter 2.2.2. --- C60doping --- p.39 / Chapter 2.3 --- Characterization Methods --- p.41 / Chapter 2.3.1 --- Electrical measurement --- p.41 / Chapter 2.3.2 --- High electric field measurement --- p.42 / Chapter 2.3.3 --- Electron Spin Resonance (ESR) --- p.43 / Chapter 2.3.4 --- Photoluminescence (PL) --- p.47 / Chapter 2.3.5 --- Photothermal Deflection Spectroscopy (PDS) --- p.48 / Chapter 2.3.6 --- Fourier Transform Infrared Spectrometry (FTIR) --- p.53 / Chapter 2.3.7 --- Mass Spectrum --- p.53 / Chapter CHAPTER 3 --- Characterization of the Fluorine implanted a-C:H Thin Films --- p.54 / Chapter 3.1 --- ESR Results --- p.55 / Chapter 3.2 --- Secondary Ion Mass Spectroscopy (SIMS) Measurement --- p.59 / Chapter 3.3 --- Electrical Properties --- p.61 / Chapter 3.4 --- Optical Properties --- p.65 / Chapter 3.4.1 --- PL Spectrum studies of fluorine implanted a-C:H films --- p.65 / Chapter 3.4.2 --- PDS Studies of fluorine implanted a-C:H films --- p.69 / Chapter 3.5 --- Nonlinear Transport Properties at High Fields --- p.76 / Chapter CHAPTER 4 --- Characterization of C60 Thin Films --- p.89 / Chapter 4.1 --- Effect of Oxygen on C60 Materials-The Stability Studies of C60 Films --- p.89 / Chapter 4.1.1 --- Defect studies-ESR measurements --- p.90 / Chapter 4.1.2 --- Structure studies of FTIR and Mass Spectrum measurements --- p.97 / Chapter 4.2 --- A Study of The Properties of Sn Doped C60 Films --- p.106 / Chapter 4.2.1 --- Surface Morphology --- p.107 / Chapter 4.2.2 --- The electrical and defect properties --- p.107 / Chapter 4.2.3 --- Optical study --- p.116 / Chapter 4.2.4 --- Structure analysis´ؤmass spectrum --- p.118 / Chapter CHAPTER 5 --- Conclusion --- p.121 / Chapter 5.1 --- Hydrogenated Amorphous Carbon --- p.121 / Chapter 5.2 --- Fullerene- C60 --- p.123 / Chapter CHAPTER 6 --- Future Works / Chapter 6.1 --- Amorphous Carbon Films --- p.125 / Chapter 6.2 --- C60 Materials --- p.125 / REFERENCES --- p.127 / APPENDIX / Chapter 1 --- ESR Results of Fluorine Implanted a-C:H Films --- p.i / Chapter 2 --- Publications --- p.ii

by Ng Tsz Bun. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2002. / Includes bibliographical references. / Abstracts in English and Chinese. / Abstract --- p.i / Acknowledgements --- p.iv / Table of contents --- p.v / List of Figure captions --- p.vii / List of Table captions --- p.xii / Chapter Chapter 1 --- INTRODUCTION --- p.1 / Chapter 1.1 --- Sol-gel synthesis / Chapter 1.2 --- Ceramic Structures / Chapter 1.3 --- Dielectric Behaviour / Chapter 1.4 --- Ferroelectricity and Piezoelectricity / Chapter 1.5 --- Metal-Insulator-Metal system / Chapter 1.6 --- Space Charge Limited Currents / Chapter Chapter 2 --- Sample Preparation and Characterisation Methods --- p.27 / Chapter 2.1 --- Preparation of Precursor Solution bya New Chemical Route / Chapter 2.2 --- Preparation of Precursor Solution for SrTi(1_x)Nbx03 Thin Films / Chapter 2.3 --- Sample Preparation / Chapter 2.4 --- Chemistry of the Sol-gel Process / Chapter 2.5 --- Rutherford Backscattering Spectrometry (RBS) / Chapter 2.6 --- X-ray Diffraction (XRD) / Chapter 2.7 --- X-ray Photoelectron Spectroscopy (XPS) / Chapter 2.8 --- Atom Force Microscopy (AFM) / Chapter 2.9 --- Transmission Electron Microscopy (TEM) / Chapter Chapter 3 --- Characterization of composition and thickness of SrTi03 thin Films --- p.48 / Chapter 3.1 --- Composition Characterization / Chapter 3.2 --- Thickness Characterization / Chapter Chapter 4 --- Structural Properties of STO Thin Films --- p.57 / Chapter 4.1 --- Effects of Annealing Method on STO Thin Film Structure / Chapter 4.2 --- Substrate Effects on Structure of STO Thin Films / Chapter 4.3 --- Effects of Si02 Buffer Layer on Structure of STO Thin Films / Chapter 4.4 --- Effects of STO Film Thickness on Structure of STO Thin Films / Chapter 4.5 --- Surface Morphology of STO Thin Films / Chapter Chapter 5 --- Electrical Characterization of STO Thin Films --- p.78 / Chapter 5.1 --- C-V characteristics / Chapter 5.2 --- I-V characteristics / Chapter Chapter 6 --- Effect of Niobium Doping on The STO Thin Films --- p.100 / Chapter Chapter 7 --- Conclusions and Future Work --- p.109 / Chapter 7.1 --- Conclusions / Chapter 7.2 --- Future Work / Publications --- p.112 / Appendix --- p.113 / Preparation of Cross-sectional TEM Specimen

Zhou Minjie = B₄C/FePt多層復合薄膜的製備與結構及物性研究 / 周民杰. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2006. / Includes bibliographical references (leaves 55-57). / Text in English; abstracts in English and Chinese. / Zhou Minjie = B₄C/FePt duo ceng fu he bo mo de zhi bei yu jie gou ji wu xing yan jiu / Zhou Minjie. / Abstract --- p.i / 摘要 --- p.ii / Acknowledgment --- p.iii / Table of contents --- p.iv / List of Figures --- p.vi / Chapter Chapter 1 --- Introduction --- p.1 / Chapter Chapter 2 --- Background --- p.3 / Chapter 2.1 --- Structure and properties of boron carbide (B4C) --- p.3 / Chapter 2.2 --- Ultra-high-density magnetic recording --- p.4 / Chapter 2.3 --- Properties of FePt and previous experimental works in related fields --- p.7 / Chapter Chapter 3 --- Instrumentation --- p.9 / Chapter 3.1 --- Deposition system --- p.9 / Chapter 3.1.1 --- Ion beam sputtering --- p.9 / Chapter 3.1.2 --- Magnetron sputtering --- p.12 / Chapter 3.2 --- The chemical and structural characterization of the films --- p.13 / Chapter 3.2.1 --- X-ray Photoelectron Spectroscopy (XPS) --- p.13 / Chapter 3.2.2 --- X-ray Diffraction (XRD) --- p.15 / Chapter 3.2.3 --- Transmission Electron Microscope (TEM) --- p.16 / Chapter 3.3 --- The mechanical and magnetic properties of the films --- p.22 / Chapter 3.3.1 --- Nanoindentation and Stress measurement --- p.22 / Chapter 3.3.2 --- Vibrating sample magnetometer (VSM) --- p.23 / Chapter Chapter 4 --- Microstructure and hardness of pure B4C films by ion beam sputtering --- p.25 / Chapter 4.1 --- Fabrication and characterization of pure B4C thin films --- p.25 / Chapter 4.2 --- Discussions --- p.29 / Chapter Chapter 5 --- "Microstructure, magnetic and mechanical properties of B4C/FePt multilayer composite films by magnetron sputtering" --- p.32 / Chapter 5.1 --- Processing parameters optimization --- p.33 / Chapter 5.1.1 --- Optimization of annealing temperature --- p.33 / Chapter 5.1.2 --- Optimization of the Fe/Pt ratio --- p.37 / Chapter 5.2 --- Effect of B4C amount on the properties of the films --- p.40 / Chapter 5.3 --- Effect of the Fe-Pt deposition configuration on the film properties --- p.50 / Chapter Chapter 6 --- Summary --- p.53 / Reference --- p.55

Wong Hoi Chun = Fe3O4和 ZnxFe3-xO4薄膜的制備及其熱處理效應 / 黃凱俊. / On t.p. "x" is subscript / Thesis (M.Phil.)--Chinese University of Hong Kong, 2004. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / Wong Hoi Chun = Fe3O4 he ZnxFe3-xO4 bo mo de zhi bei ji qi re chu li xiao ying / Huang Kaijun. / Acknowledgement --- p.i / Abstract --- p.ii / 論文摘要 --- p.iii / Table of contents --- p.iv / List of Figures --- p.vii / List of Tables --- p.xiii / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Introduction to magnetite and zinc ferrite / Chapter 1.1.1 --- Structure and properties --- p.1-1 / Chapter 1.1.2 --- Deposition methods of magnetite and zinc ferrite --- p.1-5 / Chapter 1.1.3 --- Review of Verwey transition --- p.1-7 / Chapter 1.1.4 --- Development of magnetic tunneling junction --- p.1-11 / Chapter 1.2 --- Research motivation --- p.1-13 / Chapter 1.3 --- Scope of this thesis --- p.1-14 / References --- p.1-15 / Chapter Chapter 2 --- Instrumentation / Chapter 2.1 --- Thin film deposition / Chapter 2.1.1 --- Facing-target sputtering technique --- p.2-1 / Chapter 2.1.2 --- Vacuum system --- p.2-3 / Chapter 2.1.3 --- Asymmetric bipolar pulsed DC power source --- p.2-4 / Chapter 2.2 --- Annealing / Chapter 2.2.1 --- Vacuum annealing system --- p.2-8 / Chapter 2.2.2 --- Oxygen annealing system --- p.2-8 / Chapter 2.3 --- Characterization / Chapter 2.3.1 --- Profilometer --- p.2-10 / Chapter 2.3.2 --- X-ray diffractometer --- p.2-10 / Chapter 2.3.3 --- X-ray fluorescence spectrometer --- p.2-12 / Chapter 2.3.4 --- Rutherford backscattering spectrometer --- p.2-12 / Chapter 2.3.5 --- X-ray photoelectron spectroscopy --- p.2-13 / Chapter 2.3.6 --- Resistance measuring system --- p.2-15 / References --- p.2-17 / Chapter Chapter 3 --- Fabrication and characteristics of epitaxial Fe304 and ZnxFe3-xO4 single layer thin film / Chapter 3.1 --- Sample preparation / Chapter 3.1.1 --- Targets for reactive sputtering --- p.3-1 / Chapter 3.1.2 --- Substrates --- p.3-2 / Chapter 3.1.3 --- Deposition procedure --- p.3-4 / Chapter 3.2 --- Characterization of Fe3O4 thin films / Chapter 3.2.1 --- Effects of oxygen partial pressure --- p.3-5 / Chapter 3.2.2 --- Effects of substrate temperature --- p.3-10 / Chapter 3.2.3 --- Effects of deposition power --- p.3-17 / Chapter 3.2.4 --- Effects of deposition pressure --- p.3-19 / Chapter 3.2.5 --- Other factors --- p.3-19 / Chapter 3.3 --- Characterization of ZnxFe3-x04 thin films / Chapter 3.3.1 --- Effects of oxygen partial pressure --- p.3-22 / Chapter 3.3.2 --- Effects of substrate temperature --- p.3-28 / Chapter 3.3.3 --- Effects of thickness --- p.3-46 / Chapter 3.4 --- Fabrication and Characterization of ZnxFe3-x04 and Fe3O4 thin films on magnesium oxide(MgO) --- p.3-49 / References --- p.3-56 / Chapter Chapter 4 --- Annealing of epitaxial Fe304 and ZnxFe3-x04 thin films / Chapter 4.1 --- Introduction --- p.4-1 / Chapter 4.2 --- Vacuum annealing of ZnxFe3-x04 thin film / Chapter 4.2.1 --- Enhancement in magnitude of the Verwey transition --- p.4-1 / Chapter 4.2.2 --- Reduction in resistivity --- p.4-5 / Chapter 4.2.3 --- Improvement of crystallinity --- p.4-5 / Chapter 4.2.4 --- Characterizations after high-temperature annealing --- p.4-11 / Chapter 4.2.5 --- Oxygen diffusion in atmosphere --- p.4-16 / Chapter 4.3 --- Oxygen annealing of ZnxFe3-x04 thin film --- p.4-18 / References --- p.4-22 / Chapter Chapter 5 --- Conclusions / Chapter 5.1 --- Conclusions --- p.5-1 / Chapter 5.2 --- Future outlook --- p.5-2

Ng, Chi Hai Alvin. / Thesis submitted in: December 2002. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2003. / Includes bibliographical references. / Abstracts in English and Chinese. / Abstract --- p.i / Acknowledgement --- p.iv / Table of Contents --- p.v / List of Figure Captions --- p.ix / List of Table Captions --- p.xx / Chapter Chapter 1 --- Introduction --- p.1 / Chapter 1.1 --- Silicon Crystal Structure --- p.1 / Chapter 1.2 --- Silicon Dioxide Structure --- p.2 / Chapter 1.3 --- Wafer Cleaning of Silicon --- p.3 / Chapter 1.3.1 --- Sources of Contamination --- p.4 / Chapter 1.3.2 --- Traditional Approach of Wafer Cleaning --- p.5 / Chapter 1.3.3 --- Recent Developments in Wafer Cleaning --- p.6 / Chapter 1.3.3.1 --- Particles --- p.6 / Chapter 1.3.3.2 --- Metal Contamination --- p.7 / Chapter 1.3.3.3 --- Organic Contamination --- p.9 / Chapter 1.3.3.4 --- Surface Microroughness --- p.9 / Chapter 1.3.3.5 --- Native Oxide --- p.11 / Chapter 1.4 --- Oxidation of Silicon --- p.13 / Chapter 1.4.1 --- The Initial Oxidation Regime --- p.17 / Chapter 1.5 --- Current Status of MOS Structure --- p.19 / Chapter 1.5.1 --- Wafer Cleaning --- p.19 / Chapter 1.5.2 --- Silicon Oxidation --- p.20 / Chapter 1.5.3 --- Ozone Oxidation --- p.24 / Chapter 1.5.4 --- High-k Dielectrics --- p.26 / Chapter 1.5.4.1 --- Silicon Oxynitride --- p.27 / Chapter 1.5.4.2 --- Hafnium Oxide and Zirconium Oxide --- p.28 / Chapter 1.5.5 --- Single Monolayer Oxide of Silicon --- p.32 / Chapter 1.6 --- Oxidation by Conventional Furnace --- p.36 / Chapter 1.7 --- Oxidation by RTO --- p.37 / Chapter 1.7.1 --- Equipment Issues --- p.38 / Chapter 1.8 --- Radiation Effects --- p.38 / Chapter 1.8.1 --- Radiation Effects on Ultrathin Gate Oxides --- p.45 / Reference --- p.45 / Chapter Chapter 2 --- Preparation and Characterization Techniques --- p.48 / Chapter 2.1 --- Conventional Furnace --- p.48 / Chapter 2.2 --- Rapid Thermal Oxidation (RTO) --- p.48 / Chapter 2.3 --- Irradiation Source --- p.49 / Chapter 2.4 --- Capacitance-Voltage (C-V) and Current-Voltage (I-V) Curves --- p.51 / Chapter 2.4.1 --- Definition of Potential and Sign Conventions --- p.51 / Chapter 2.4.2 --- The Poisson Equation --- p.55 / Chapter 2.4.3 --- Low Frequency Capacitance --- p.58 / Chapter 2.4.3.1 --- Sum of Series Capacitors --- p.58 / Chapter 2.4.3.2 --- Discussion of Various Terms Contributing to the Field --- p.60 / Chapter 2.4.3.3 --- Calculation of the Low Frequency Capacitance --- p.62 / Chapter 2.4.3.4 --- "Simpler Forms of Capacitancein Accumulation, at Flatband, in Depletion and Inversion" --- p.63 / Chapter 2.4.4 --- High Frequency C-V Curves --- p.65 / Chapter 2.4.5 --- Experimental Setups --- p.66 / Chapter 2.5 --- Conductance-Voltage (G-V) Characterization --- p.67 / Chapter 2.5.1 --- Experimental Details --- p.68 / Chapter 2.6 --- Ellipsometry --- p.69 / Chapter 2.7 --- Rutherford Backscattering Spectrometry --- p.71 / Chapter 2.7.1 --- Experimental Setup --- p.72 / Reference --- p.72 / Chapter Chapter 3 --- Annealing Effects of Conventional Furnace Grown Oxide --- p.74 / Chapter 3.1 --- Experiment --- p.74 / Chapter 3.2 --- Results --- p.74 / Chapter 3.3 --- Conclusions --- p.85 / Reference --- p.86 / Chapter Chapter 4 --- Rapid Thermal Oxidation of MOS Capacitors --- p.87 / Chapter 4.1 --- Experiment --- p.87 / Chapter 4.2 --- Results and Discussions --- p.90 / Chapter 4.3 --- Conclusions --- p.114 / Reference --- p.115 / Chapter Chapter 5 --- Ionizing Radiation on MOS Capacitors --- p.117 / Chapter 5.1 --- Experimental Setup --- p.117 / Chapter 5.2 --- Results and Discussions --- p.120 / Chapter 5.3 --- Conclusions --- p.149 / Reference --- p.151 / Chapter Chapter 6 --- Conclusions --- p.153 / Chapter 6.1 --- Summary --- p.153 / Chapter 6.2 --- Future Work --- p.155 / Reference --- p.157

Wan King Tin = La2/3Ca1/3MnO3薄膜的各向異性磁致電阻 / 尹擎天. / Thesis submitted in: August 2003. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2004. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / Wan King Tin = La2/3Ca1/3MnO3 bo mo de ge xiang yi xing ci zhi dian zu / Yin Qingtian. / Acknowledgments --- p.i / Abstract --- p.ii / 論文摘要 --- p.iv / Table of Contents --- p.v / List of figures --- p.vii / List of tables --- p.xi / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Introduction to Colossal Magnetoresistance (CMR) --- p.1 / Chapter 1.2 --- Origin of CMR --- p.6 / Chapter 1.3 --- Anisotropic Magnetoresistance (AMR) of LCMO Thin Film --- p.8 / Chapter 1.4 --- Properties near Tc / Chapter 1.4.1 --- Sharpness of transition --- p.13 / Chapter 1.4.2 --- Expansivity --- p.16 / Chapter 1.5 --- The motivation of this work --- p.19 / References --- p.20 / Chapter Chapter 2 --- Experimental methods / Chapter 2.1 --- Preparation of LCMO thin films --- p.23 / Chapter 2.2 --- Measurement of resistance and anisotropic magnetoresistance --- p.25 / References --- p.30 / Chapter Chapter 3 --- Properties of anisotropic magnetoresistance of single layer LCMO thin film / Chapter 3.1 --- Magnetic Field dependence of AMR / Chapter 3.1.1 --- In-plane AMR --- p.31 / Chapter 3.1.2 --- Out-of-plane AMR --- p.55 / Chapter 3.2 --- Temperature dependence of AMR --- p.65 / Chapter 3.3 --- Effect of c axis alignment --- p.75 / Chapter 4.4 --- "Effect of thickness, sharpness and Tp to AMR and their correlations " --- p.83 / References --- p.101 / Chapter Chapter 4 --- AMR of LCMO/PCMO Multilayer --- p.102 / References --- p.113 / Chapter Chapter 5 --- Conclusion --- p.114 / References --- p.117

Li Chak Ming = 18O氧同位素效應對La0.67Ca0.33MnO3薄膜之影響 / 李澤銘. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2005. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / Li Chak Ming = 18O yang tong wei su xiao ying dui La0.67Ca0.33MnO3 bo mo zhi ying xiang / Li Zeming. / Acknowledgement --- p.i / Abstract --- p.ii / 論文摘要 --- p.iii / Table of Contents --- p.iv / List of Figures --- p.viii / List of Tables --- p.xi / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Magnetoresistance (MR) 1 - --- p.1 / Chapter 1.1.1 --- Magnetoresistance (MR) 1 - --- p.1 / Chapter 1.1.2 --- Giant Magnetoresistance (GMR) 1 - --- p.1 / Chapter 1.1.3 --- Anisotropy Magnetoresistance (AMR) 1 - --- p.2 / Chapter 1.1.4 --- Colossal Magnetoresistance (CMR) --- p.1-4 / Chapter 1.1.5 --- Double exchange mechanism 1 - --- p.6 / Chapter 1.1.6 --- Jahn-Teller effect --- p.1-6 / Chapter 1.1.7 --- Tolerance factor 1 - --- p.7 / Chapter 1.1.8 --- The effect of doping --- p.1-10 / Chapter 1.2 --- Possible origin of oxygen isotope effect --- p.1-12 / Chapter 1.3 --- Our approach --- p.1-14 / Chapter 1.4 --- Scope of this thesis work --- p.1-14 / Chapter Chapter 2 --- Experimental methods / Chapter 2.1 --- Thin film deposition --- p.2-1 / Chapter 2.1.1 --- Facing Target Sputering (FTS) --- p.2-1 / Chapter 2.1.2 --- Vacuum system --- p.2-4 / Chapter 2.2 --- Annealing systems --- p.2-6 / Chapter 2.2.1 --- Oxygen annealing system --- p.2-6 / Chapter 2.2.2 --- Oxygen exchange system --- p.2-8 / Chapter 2.2.3 --- Vacuum annealing system --- p.2-10 / Chapter 2.3 --- Characterization --- p.2-12 / Chapter 2.3.1 --- a -step profilometer --- p.2-12 / Chapter 2.3.2 --- X-ray diffraction (XRD) --- p.2-12 / Chapter 2.3.3 --- Resistance measurement --- p.2-15 / Chapter Chapter 3 --- Epitaxial growth of LCMO single layer thin film / Chapter 3.1 --- Fabrications and characterization of La0.67Ca0.33MnO3 target --- p.3-1 / Chapter 3.2 --- Substrate materials --- p.3-6 / Chapter 3.3 --- Preparation of LCMO thin film --- p.3-8 / Chapter 3.3.1 --- Deposition conditions --- p.3-8 / Chapter 3.3.2 --- Deposition procedure --- p.3-10 / Chapter 3.3.3 --- Post-annealing effect --- p.3-13 / Chapter Chapter 4 --- Oxygen in LCMO thin film / Chapter 4.1 --- Introduction --- p.4-1 / Chapter 4.2 --- High Pressure Oxygenation --- p.4-2 / Chapter 4.3 --- Characterization --- p.4-7 / Chapter 4.3.1 --- Determination of oxygen content --- p.4-9 / Chapter 4.3.2 --- "Tolerance factor, t" --- p.4-12 / Chapter Chapter 5 --- Oxygen isotope effect in LCMO thin film / Chapter 5.1 --- Introduction --- p.5-1 / Chapter 5.2 --- Identification on successiveness of oxygen exchange --- p.5-4 / Chapter 5.2.1 --- Sample preparation --- p.5-4 / Chapter 5.2.2 --- Oxygen annealing treatment --- p.5-4 / Chapter 5.2.3 --- Identification of 18O by SIMS --- p.5-4 / Chapter 5.3 --- Investigation of isotope effect on LCMO thin film --- p.5-7 / Chapter 5.3.1 --- Sample preparation --- p.5-7 / Chapter 5.3.2 --- Oxygen exchange --- p.5-7 / Chapter 5.3.3 --- Vacuum annealing --- p.5-9 / Chapter 5.3.4 --- Isotope effect --- p.5-9 / Chapter 5.4 --- Conclusions --- p.5-19 / Chapter Chapter 6 --- Isotope effect on the hopping activation energy / Chapter 6.1 --- Introduction --- p.6-1 / Chapter 6.1.1 --- Variable range hopping --- p.6-2 / Chapter 6.1.2 --- Small polaron models --- p.6-2 / Chapter 6.2 --- Activation energy --- p.6-4 / Chapter 6.3 --- Discussions --- p.6-9 / Chapter Chapter 7 --- Conclusions --- p.7-1

"March 2002." / The numerals in title are subscript. / Thesis (Ph.D.)--Chinese University of Hong Kong, 2002. / Includes bibliographical references. / Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. / Mode of access: World Wide Web. / Abstracts in English and Chinese.

Zhou Wenli. / "October 2003." / Thesis (Ph.D.)--Chinese University of Hong Kong, 2003. / Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. / Mode of access: World Wide Web. / Abstracts in English and Chinese.