This thesis is focused on the description of selected deposition methods of thin films using low-temperature plasma. Currently, many various technologies of thin films are developed and there are many applications in various industrial sectors. This thesis first gives a brief overview of deposition methods, plasma behavior during deposition and subsequent description of the selected methods of application due to the physical and chemical processes. They also discussed the advantages and disadvantages of the described coating technologies, and several examples of their use. The thesis should thus contribute to the overall view of modern coating technologies, their development and use currently, or possible use in the future.