• Refine Query
  • Source
  • Publication year
  • to
  • Language
  • 1603
  • 486
  • 282
  • 207
  • 61
  • 60
  • 45
  • 28
  • 14
  • 14
  • 14
  • 14
  • 14
  • 14
  • 12
  • Tagged with
  • 3338
  • 3338
  • 477
  • 467
  • 432
  • 359
  • 315
  • 300
  • 270
  • 230
  • 216
  • 205
  • 203
  • 198
  • 198
  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
91

Physical properties of chemically sprayed cadmium sulfide thin films and their applications to solar cells.

January 1977 (has links)
Thesis (M.Phil.)--Chinese University of Hong Kong. / Bibliography: leaves 211-214.
92

Growth, Modification, and characterization of carbon based thin film materials.

January 1996 (has links)
by KE Ning. / Thesis (Ph.D.)--Chinese University of Hong Kong, 1996. / Includes bibliographical references (leaves 127-134). / ACKNOWLEDGMENT --- p.a1 / ABSTRACT --- p.a2 / CONTENTS --- p.a3 / LIST OF FIGURE --- p.a6 / LIST OF TABLE --- p.a10 / Chapter CHAPTER 1 --- Introduction / Chapter 1.1 --- Overview of Some Carbon-Based Materials --- p.1 / Chapter 1.2 --- Diamond-Like Carbon (DLC) Thin Films --- p.3 / Chapter 1.2.1 --- Introduction --- p.3 / Chapter 1.2.2 --- Applications of DLC films --- p.9 / Chapter 1.2.3 --- The role of hydrogen --- p.10 / Chapter 1.2.4 --- The role of fluorine and the scope of this work --- p.13 / Chapter 1.3 --- Fullerenes --- p.17 / Chapter 1.3.1 --- Introduction --- p.17 / Chapter 1.3.2 --- Applications --- p.20 / Chapter 1.3.3 --- "The oxygen effect, the metal doping effect and the Scope of this study" --- p.23 / Chapter 1.4 --- Organization of This Thesis --- p.26 / Chapter CHAPTER 2 --- Experimental --- p.27 / Chapter 2.1 --- Samples Preparation and Thin Films Deposition --- p.27 / Chapter 2.1.1 --- Hydrogenated amorphous carbon thin film --- p.27 / Chapter 2.1.2 --- The fullerenes and C60 synthesis --- p.30 / Chapter 2.1.3 --- C60 thin film deposition --- p.34 / Chapter 2.2 --- Modification --- p.35 / Chapter 2.2.1 --- Ion implantation of a-C:H films --- p.35 / Chapter 2.2.2. --- C60doping --- p.39 / Chapter 2.3 --- Characterization Methods --- p.41 / Chapter 2.3.1 --- Electrical measurement --- p.41 / Chapter 2.3.2 --- High electric field measurement --- p.42 / Chapter 2.3.3 --- Electron Spin Resonance (ESR) --- p.43 / Chapter 2.3.4 --- Photoluminescence (PL) --- p.47 / Chapter 2.3.5 --- Photothermal Deflection Spectroscopy (PDS) --- p.48 / Chapter 2.3.6 --- Fourier Transform Infrared Spectrometry (FTIR) --- p.53 / Chapter 2.3.7 --- Mass Spectrum --- p.53 / Chapter CHAPTER 3 --- Characterization of the Fluorine implanted a-C:H Thin Films --- p.54 / Chapter 3.1 --- ESR Results --- p.55 / Chapter 3.2 --- Secondary Ion Mass Spectroscopy (SIMS) Measurement --- p.59 / Chapter 3.3 --- Electrical Properties --- p.61 / Chapter 3.4 --- Optical Properties --- p.65 / Chapter 3.4.1 --- PL Spectrum studies of fluorine implanted a-C:H films --- p.65 / Chapter 3.4.2 --- PDS Studies of fluorine implanted a-C:H films --- p.69 / Chapter 3.5 --- Nonlinear Transport Properties at High Fields --- p.76 / Chapter CHAPTER 4 --- Characterization of C60 Thin Films --- p.89 / Chapter 4.1 --- Effect of Oxygen on C60 Materials-The Stability Studies of C60 Films --- p.89 / Chapter 4.1.1 --- Defect studies-ESR measurements --- p.90 / Chapter 4.1.2 --- Structure studies of FTIR and Mass Spectrum measurements --- p.97 / Chapter 4.2 --- A Study of The Properties of Sn Doped C60 Films --- p.106 / Chapter 4.2.1 --- Surface Morphology --- p.107 / Chapter 4.2.2 --- The electrical and defect properties --- p.107 / Chapter 4.2.3 --- Optical study --- p.116 / Chapter 4.2.4 --- Structure analysis´ؤmass spectrum --- p.118 / Chapter CHAPTER 5 --- Conclusion --- p.121 / Chapter 5.1 --- Hydrogenated Amorphous Carbon --- p.121 / Chapter 5.2 --- Fullerene- C60 --- p.123 / Chapter CHAPTER 6 --- Future Works / Chapter 6.1 --- Amorphous Carbon Films --- p.125 / Chapter 6.2 --- C60 Materials --- p.125 / REFERENCES --- p.127 / APPENDIX / Chapter 1 --- ESR Results of Fluorine Implanted a-C:H Films --- p.i / Chapter 2 --- Publications --- p.ii
93

Preparation and characterization of SrTiO₃ thin films by modified metalorganic decomposition technique.

January 2002 (has links)
by Ng Tsz Bun. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2002. / Includes bibliographical references. / Abstracts in English and Chinese. / Abstract --- p.i / Acknowledgements --- p.iv / Table of contents --- p.v / List of Figure captions --- p.vii / List of Table captions --- p.xii / Chapter Chapter 1 --- INTRODUCTION --- p.1 / Chapter 1.1 --- Sol-gel synthesis / Chapter 1.2 --- Ceramic Structures / Chapter 1.3 --- Dielectric Behaviour / Chapter 1.4 --- Ferroelectricity and Piezoelectricity / Chapter 1.5 --- Metal-Insulator-Metal system / Chapter 1.6 --- Space Charge Limited Currents / Chapter Chapter 2 --- Sample Preparation and Characterisation Methods --- p.27 / Chapter 2.1 --- Preparation of Precursor Solution bya New Chemical Route / Chapter 2.2 --- Preparation of Precursor Solution for SrTi(1_x)Nbx03 Thin Films / Chapter 2.3 --- Sample Preparation / Chapter 2.4 --- Chemistry of the Sol-gel Process / Chapter 2.5 --- Rutherford Backscattering Spectrometry (RBS) / Chapter 2.6 --- X-ray Diffraction (XRD) / Chapter 2.7 --- X-ray Photoelectron Spectroscopy (XPS) / Chapter 2.8 --- Atom Force Microscopy (AFM) / Chapter 2.9 --- Transmission Electron Microscopy (TEM) / Chapter Chapter 3 --- Characterization of composition and thickness of SrTi03 thin Films --- p.48 / Chapter 3.1 --- Composition Characterization / Chapter 3.2 --- Thickness Characterization / Chapter Chapter 4 --- Structural Properties of STO Thin Films --- p.57 / Chapter 4.1 --- Effects of Annealing Method on STO Thin Film Structure / Chapter 4.2 --- Substrate Effects on Structure of STO Thin Films / Chapter 4.3 --- Effects of Si02 Buffer Layer on Structure of STO Thin Films / Chapter 4.4 --- Effects of STO Film Thickness on Structure of STO Thin Films / Chapter 4.5 --- Surface Morphology of STO Thin Films / Chapter Chapter 5 --- Electrical Characterization of STO Thin Films --- p.78 / Chapter 5.1 --- C-V characteristics / Chapter 5.2 --- I-V characteristics / Chapter Chapter 6 --- Effect of Niobium Doping on The STO Thin Films --- p.100 / Chapter Chapter 7 --- Conclusions and Future Work --- p.109 / Chapter 7.1 --- Conclusions / Chapter 7.2 --- Future Work / Publications --- p.112 / Appendix --- p.113 / Preparation of Cross-sectional TEM Specimen
94

Deposition, microstructure, and properties of B₄C/FePt multilayer composite films. / B₄C/FePt多層復合薄膜的製備與結構及物性研究 / Deposition, microstructure, & properties of B₄C/FePt multilayer composite films / Deposition, microstructure, and properties of B₄C/FePt multilayer composite films. / B₄C/FePt duo ceng fu he bo mo de zhi bei yu jie gou ji wu xing yan jiu

January 2006 (has links)
Zhou Minjie = B₄C/FePt多層復合薄膜的製備與結構及物性研究 / 周民杰. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2006. / Includes bibliographical references (leaves 55-57). / Text in English; abstracts in English and Chinese. / Zhou Minjie = B₄C/FePt duo ceng fu he bo mo de zhi bei yu jie gou ji wu xing yan jiu / Zhou Minjie. / Abstract --- p.i / 摘要 --- p.ii / Acknowledgment --- p.iii / Table of contents --- p.iv / List of Figures --- p.vi / Chapter Chapter 1 --- Introduction --- p.1 / Chapter Chapter 2 --- Background --- p.3 / Chapter 2.1 --- Structure and properties of boron carbide (B4C) --- p.3 / Chapter 2.2 --- Ultra-high-density magnetic recording --- p.4 / Chapter 2.3 --- Properties of FePt and previous experimental works in related fields --- p.7 / Chapter Chapter 3 --- Instrumentation --- p.9 / Chapter 3.1 --- Deposition system --- p.9 / Chapter 3.1.1 --- Ion beam sputtering --- p.9 / Chapter 3.1.2 --- Magnetron sputtering --- p.12 / Chapter 3.2 --- The chemical and structural characterization of the films --- p.13 / Chapter 3.2.1 --- X-ray Photoelectron Spectroscopy (XPS) --- p.13 / Chapter 3.2.2 --- X-ray Diffraction (XRD) --- p.15 / Chapter 3.2.3 --- Transmission Electron Microscope (TEM) --- p.16 / Chapter 3.3 --- The mechanical and magnetic properties of the films --- p.22 / Chapter 3.3.1 --- Nanoindentation and Stress measurement --- p.22 / Chapter 3.3.2 --- Vibrating sample magnetometer (VSM) --- p.23 / Chapter Chapter 4 --- Microstructure and hardness of pure B4C films by ion beam sputtering --- p.25 / Chapter 4.1 --- Fabrication and characterization of pure B4C thin films --- p.25 / Chapter 4.2 --- Discussions --- p.29 / Chapter Chapter 5 --- "Microstructure, magnetic and mechanical properties of B4C/FePt multilayer composite films by magnetron sputtering" --- p.32 / Chapter 5.1 --- Processing parameters optimization --- p.33 / Chapter 5.1.1 --- Optimization of annealing temperature --- p.33 / Chapter 5.1.2 --- Optimization of the Fe/Pt ratio --- p.37 / Chapter 5.2 --- Effect of B4C amount on the properties of the films --- p.40 / Chapter 5.3 --- Effect of the Fe-Pt deposition configuration on the film properties --- p.50 / Chapter Chapter 6 --- Summary --- p.53 / Reference --- p.55
95

Fabrication of Fe3O4 and ZnxFe3-xO4 thin films and annealing effects. / Fe3O4和 ZnxFe3-xO4薄膜的制備及其熱處理效應 / Fabrication of Fe3O4 and ZnxFe3-xO4 thin films and annealing effects. / Fe3O4 he ZnxFe3-xO4 bo mo de chi bei ji qi re chu li xiao ying

January 2004 (has links)
Wong Hoi Chun = Fe3O4和 ZnxFe3-xO4薄膜的制備及其熱處理效應 / 黃凱俊. / On t.p. "x" is subscript / Thesis (M.Phil.)--Chinese University of Hong Kong, 2004. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / Wong Hoi Chun = Fe3O4 he ZnxFe3-xO4 bo mo de zhi bei ji qi re chu li xiao ying / Huang Kaijun. / Acknowledgement --- p.i / Abstract --- p.ii / 論文摘要 --- p.iii / Table of contents --- p.iv / List of Figures --- p.vii / List of Tables --- p.xiii / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Introduction to magnetite and zinc ferrite / Chapter 1.1.1 --- Structure and properties --- p.1-1 / Chapter 1.1.2 --- Deposition methods of magnetite and zinc ferrite --- p.1-5 / Chapter 1.1.3 --- Review of Verwey transition --- p.1-7 / Chapter 1.1.4 --- Development of magnetic tunneling junction --- p.1-11 / Chapter 1.2 --- Research motivation --- p.1-13 / Chapter 1.3 --- Scope of this thesis --- p.1-14 / References --- p.1-15 / Chapter Chapter 2 --- Instrumentation / Chapter 2.1 --- Thin film deposition / Chapter 2.1.1 --- Facing-target sputtering technique --- p.2-1 / Chapter 2.1.2 --- Vacuum system --- p.2-3 / Chapter 2.1.3 --- Asymmetric bipolar pulsed DC power source --- p.2-4 / Chapter 2.2 --- Annealing / Chapter 2.2.1 --- Vacuum annealing system --- p.2-8 / Chapter 2.2.2 --- Oxygen annealing system --- p.2-8 / Chapter 2.3 --- Characterization / Chapter 2.3.1 --- Profilometer --- p.2-10 / Chapter 2.3.2 --- X-ray diffractometer --- p.2-10 / Chapter 2.3.3 --- X-ray fluorescence spectrometer --- p.2-12 / Chapter 2.3.4 --- Rutherford backscattering spectrometer --- p.2-12 / Chapter 2.3.5 --- X-ray photoelectron spectroscopy --- p.2-13 / Chapter 2.3.6 --- Resistance measuring system --- p.2-15 / References --- p.2-17 / Chapter Chapter 3 --- Fabrication and characteristics of epitaxial Fe304 and ZnxFe3-xO4 single layer thin film / Chapter 3.1 --- Sample preparation / Chapter 3.1.1 --- Targets for reactive sputtering --- p.3-1 / Chapter 3.1.2 --- Substrates --- p.3-2 / Chapter 3.1.3 --- Deposition procedure --- p.3-4 / Chapter 3.2 --- Characterization of Fe3O4 thin films / Chapter 3.2.1 --- Effects of oxygen partial pressure --- p.3-5 / Chapter 3.2.2 --- Effects of substrate temperature --- p.3-10 / Chapter 3.2.3 --- Effects of deposition power --- p.3-17 / Chapter 3.2.4 --- Effects of deposition pressure --- p.3-19 / Chapter 3.2.5 --- Other factors --- p.3-19 / Chapter 3.3 --- Characterization of ZnxFe3-x04 thin films / Chapter 3.3.1 --- Effects of oxygen partial pressure --- p.3-22 / Chapter 3.3.2 --- Effects of substrate temperature --- p.3-28 / Chapter 3.3.3 --- Effects of thickness --- p.3-46 / Chapter 3.4 --- Fabrication and Characterization of ZnxFe3-x04 and Fe3O4 thin films on magnesium oxide(MgO) --- p.3-49 / References --- p.3-56 / Chapter Chapter 4 --- Annealing of epitaxial Fe304 and ZnxFe3-x04 thin films / Chapter 4.1 --- Introduction --- p.4-1 / Chapter 4.2 --- Vacuum annealing of ZnxFe3-x04 thin film / Chapter 4.2.1 --- Enhancement in magnitude of the Verwey transition --- p.4-1 / Chapter 4.2.2 --- Reduction in resistivity --- p.4-5 / Chapter 4.2.3 --- Improvement of crystallinity --- p.4-5 / Chapter 4.2.4 --- Characterizations after high-temperature annealing --- p.4-11 / Chapter 4.2.5 --- Oxygen diffusion in atmosphere --- p.4-16 / Chapter 4.3 --- Oxygen annealing of ZnxFe3-x04 thin film --- p.4-18 / References --- p.4-22 / Chapter Chapter 5 --- Conclusions / Chapter 5.1 --- Conclusions --- p.5-1 / Chapter 5.2 --- Future outlook --- p.5-2
96

Preparation and characterization of ultrathin SiO₂ films and a study of radiation effects on the films.

January 2003 (has links)
Ng, Chi Hai Alvin. / Thesis submitted in: December 2002. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2003. / Includes bibliographical references. / Abstracts in English and Chinese. / Abstract --- p.i / Acknowledgement --- p.iv / Table of Contents --- p.v / List of Figure Captions --- p.ix / List of Table Captions --- p.xx / Chapter Chapter 1 --- Introduction --- p.1 / Chapter 1.1 --- Silicon Crystal Structure --- p.1 / Chapter 1.2 --- Silicon Dioxide Structure --- p.2 / Chapter 1.3 --- Wafer Cleaning of Silicon --- p.3 / Chapter 1.3.1 --- Sources of Contamination --- p.4 / Chapter 1.3.2 --- Traditional Approach of Wafer Cleaning --- p.5 / Chapter 1.3.3 --- Recent Developments in Wafer Cleaning --- p.6 / Chapter 1.3.3.1 --- Particles --- p.6 / Chapter 1.3.3.2 --- Metal Contamination --- p.7 / Chapter 1.3.3.3 --- Organic Contamination --- p.9 / Chapter 1.3.3.4 --- Surface Microroughness --- p.9 / Chapter 1.3.3.5 --- Native Oxide --- p.11 / Chapter 1.4 --- Oxidation of Silicon --- p.13 / Chapter 1.4.1 --- The Initial Oxidation Regime --- p.17 / Chapter 1.5 --- Current Status of MOS Structure --- p.19 / Chapter 1.5.1 --- Wafer Cleaning --- p.19 / Chapter 1.5.2 --- Silicon Oxidation --- p.20 / Chapter 1.5.3 --- Ozone Oxidation --- p.24 / Chapter 1.5.4 --- High-k Dielectrics --- p.26 / Chapter 1.5.4.1 --- Silicon Oxynitride --- p.27 / Chapter 1.5.4.2 --- Hafnium Oxide and Zirconium Oxide --- p.28 / Chapter 1.5.5 --- Single Monolayer Oxide of Silicon --- p.32 / Chapter 1.6 --- Oxidation by Conventional Furnace --- p.36 / Chapter 1.7 --- Oxidation by RTO --- p.37 / Chapter 1.7.1 --- Equipment Issues --- p.38 / Chapter 1.8 --- Radiation Effects --- p.38 / Chapter 1.8.1 --- Radiation Effects on Ultrathin Gate Oxides --- p.45 / Reference --- p.45 / Chapter Chapter 2 --- Preparation and Characterization Techniques --- p.48 / Chapter 2.1 --- Conventional Furnace --- p.48 / Chapter 2.2 --- Rapid Thermal Oxidation (RTO) --- p.48 / Chapter 2.3 --- Irradiation Source --- p.49 / Chapter 2.4 --- Capacitance-Voltage (C-V) and Current-Voltage (I-V) Curves --- p.51 / Chapter 2.4.1 --- Definition of Potential and Sign Conventions --- p.51 / Chapter 2.4.2 --- The Poisson Equation --- p.55 / Chapter 2.4.3 --- Low Frequency Capacitance --- p.58 / Chapter 2.4.3.1 --- Sum of Series Capacitors --- p.58 / Chapter 2.4.3.2 --- Discussion of Various Terms Contributing to the Field --- p.60 / Chapter 2.4.3.3 --- Calculation of the Low Frequency Capacitance --- p.62 / Chapter 2.4.3.4 --- "Simpler Forms of Capacitancein Accumulation, at Flatband, in Depletion and Inversion" --- p.63 / Chapter 2.4.4 --- High Frequency C-V Curves --- p.65 / Chapter 2.4.5 --- Experimental Setups --- p.66 / Chapter 2.5 --- Conductance-Voltage (G-V) Characterization --- p.67 / Chapter 2.5.1 --- Experimental Details --- p.68 / Chapter 2.6 --- Ellipsometry --- p.69 / Chapter 2.7 --- Rutherford Backscattering Spectrometry --- p.71 / Chapter 2.7.1 --- Experimental Setup --- p.72 / Reference --- p.72 / Chapter Chapter 3 --- Annealing Effects of Conventional Furnace Grown Oxide --- p.74 / Chapter 3.1 --- Experiment --- p.74 / Chapter 3.2 --- Results --- p.74 / Chapter 3.3 --- Conclusions --- p.85 / Reference --- p.86 / Chapter Chapter 4 --- Rapid Thermal Oxidation of MOS Capacitors --- p.87 / Chapter 4.1 --- Experiment --- p.87 / Chapter 4.2 --- Results and Discussions --- p.90 / Chapter 4.3 --- Conclusions --- p.114 / Reference --- p.115 / Chapter Chapter 5 --- Ionizing Radiation on MOS Capacitors --- p.117 / Chapter 5.1 --- Experimental Setup --- p.117 / Chapter 5.2 --- Results and Discussions --- p.120 / Chapter 5.3 --- Conclusions --- p.149 / Reference --- p.151 / Chapter Chapter 6 --- Conclusions --- p.153 / Chapter 6.1 --- Summary --- p.153 / Chapter 6.2 --- Future Work --- p.155 / Reference --- p.157
97

Anisotropic magnetoresistance of La2/3Ca1/3MnO3 thin film. / La2/3Ca1/3MnO3薄膜的各向異性磁致電阻 / Anisotropic magnetoresistance of La2/3Ca1/3MnO3 thin film. / La2/3Ca1/3MnO3 bo mo de ge xiang yi xing ci zhi dian zu

January 2004 (has links)
Wan King Tin = La2/3Ca1/3MnO3薄膜的各向異性磁致電阻 / 尹擎天. / Thesis submitted in: August 2003. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2004. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / Wan King Tin = La2/3Ca1/3MnO3 bo mo de ge xiang yi xing ci zhi dian zu / Yin Qingtian. / Acknowledgments --- p.i / Abstract --- p.ii / 論文摘要 --- p.iv / Table of Contents --- p.v / List of figures --- p.vii / List of tables --- p.xi / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Introduction to Colossal Magnetoresistance (CMR) --- p.1 / Chapter 1.2 --- Origin of CMR --- p.6 / Chapter 1.3 --- Anisotropic Magnetoresistance (AMR) of LCMO Thin Film --- p.8 / Chapter 1.4 --- Properties near Tc / Chapter 1.4.1 --- Sharpness of transition --- p.13 / Chapter 1.4.2 --- Expansivity --- p.16 / Chapter 1.5 --- The motivation of this work --- p.19 / References --- p.20 / Chapter Chapter 2 --- Experimental methods / Chapter 2.1 --- Preparation of LCMO thin films --- p.23 / Chapter 2.2 --- Measurement of resistance and anisotropic magnetoresistance --- p.25 / References --- p.30 / Chapter Chapter 3 --- Properties of anisotropic magnetoresistance of single layer LCMO thin film / Chapter 3.1 --- Magnetic Field dependence of AMR / Chapter 3.1.1 --- In-plane AMR --- p.31 / Chapter 3.1.2 --- Out-of-plane AMR --- p.55 / Chapter 3.2 --- Temperature dependence of AMR --- p.65 / Chapter 3.3 --- Effect of c axis alignment --- p.75 / Chapter 4.4 --- "Effect of thickness, sharpness and Tp to AMR and their correlations " --- p.83 / References --- p.101 / Chapter Chapter 4 --- AMR of LCMO/PCMO Multilayer --- p.102 / References --- p.113 / Chapter Chapter 5 --- Conclusion --- p.114 / References --- p.117
98

Oxygen isotope effects in La0.67Ca0.33MnO3 thin films. / 18O氧同位素效應對La0.67Ca0.33MnO3薄膜之影響 / Oxygen isotope effects in La0.67Ca0.33MnO3 thin films. / 18O yang tong wei su xiao ying dui La0.67Ca0.33MnO3 bo mo zhi ying xiang

January 2005 (has links)
Li Chak Ming = 18O氧同位素效應對La0.67Ca0.33MnO3薄膜之影響 / 李澤銘. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2005. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / Li Chak Ming = 18O yang tong wei su xiao ying dui La0.67Ca0.33MnO3 bo mo zhi ying xiang / Li Zeming. / Acknowledgement --- p.i / Abstract --- p.ii / 論文摘要 --- p.iii / Table of Contents --- p.iv / List of Figures --- p.viii / List of Tables --- p.xi / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Magnetoresistance (MR) 1 - --- p.1 / Chapter 1.1.1 --- Magnetoresistance (MR) 1 - --- p.1 / Chapter 1.1.2 --- Giant Magnetoresistance (GMR) 1 - --- p.1 / Chapter 1.1.3 --- Anisotropy Magnetoresistance (AMR) 1 - --- p.2 / Chapter 1.1.4 --- Colossal Magnetoresistance (CMR) --- p.1-4 / Chapter 1.1.5 --- Double exchange mechanism 1 - --- p.6 / Chapter 1.1.6 --- Jahn-Teller effect --- p.1-6 / Chapter 1.1.7 --- Tolerance factor 1 - --- p.7 / Chapter 1.1.8 --- The effect of doping --- p.1-10 / Chapter 1.2 --- Possible origin of oxygen isotope effect --- p.1-12 / Chapter 1.3 --- Our approach --- p.1-14 / Chapter 1.4 --- Scope of this thesis work --- p.1-14 / Chapter Chapter 2 --- Experimental methods / Chapter 2.1 --- Thin film deposition --- p.2-1 / Chapter 2.1.1 --- Facing Target Sputering (FTS) --- p.2-1 / Chapter 2.1.2 --- Vacuum system --- p.2-4 / Chapter 2.2 --- Annealing systems --- p.2-6 / Chapter 2.2.1 --- Oxygen annealing system --- p.2-6 / Chapter 2.2.2 --- Oxygen exchange system --- p.2-8 / Chapter 2.2.3 --- Vacuum annealing system --- p.2-10 / Chapter 2.3 --- Characterization --- p.2-12 / Chapter 2.3.1 --- a -step profilometer --- p.2-12 / Chapter 2.3.2 --- X-ray diffraction (XRD) --- p.2-12 / Chapter 2.3.3 --- Resistance measurement --- p.2-15 / Chapter Chapter 3 --- Epitaxial growth of LCMO single layer thin film / Chapter 3.1 --- Fabrications and characterization of La0.67Ca0.33MnO3 target --- p.3-1 / Chapter 3.2 --- Substrate materials --- p.3-6 / Chapter 3.3 --- Preparation of LCMO thin film --- p.3-8 / Chapter 3.3.1 --- Deposition conditions --- p.3-8 / Chapter 3.3.2 --- Deposition procedure --- p.3-10 / Chapter 3.3.3 --- Post-annealing effect --- p.3-13 / Chapter Chapter 4 --- Oxygen in LCMO thin film / Chapter 4.1 --- Introduction --- p.4-1 / Chapter 4.2 --- High Pressure Oxygenation --- p.4-2 / Chapter 4.3 --- Characterization --- p.4-7 / Chapter 4.3.1 --- Determination of oxygen content --- p.4-9 / Chapter 4.3.2 --- "Tolerance factor, t" --- p.4-12 / Chapter Chapter 5 --- Oxygen isotope effect in LCMO thin film / Chapter 5.1 --- Introduction --- p.5-1 / Chapter 5.2 --- Identification on successiveness of oxygen exchange --- p.5-4 / Chapter 5.2.1 --- Sample preparation --- p.5-4 / Chapter 5.2.2 --- Oxygen annealing treatment --- p.5-4 / Chapter 5.2.3 --- Identification of 18O by SIMS --- p.5-4 / Chapter 5.3 --- Investigation of isotope effect on LCMO thin film --- p.5-7 / Chapter 5.3.1 --- Sample preparation --- p.5-7 / Chapter 5.3.2 --- Oxygen exchange --- p.5-7 / Chapter 5.3.3 --- Vacuum annealing --- p.5-9 / Chapter 5.3.4 --- Isotope effect --- p.5-9 / Chapter 5.4 --- Conclusions --- p.5-19 / Chapter Chapter 6 --- Isotope effect on the hopping activation energy / Chapter 6.1 --- Introduction --- p.6-1 / Chapter 6.1.1 --- Variable range hopping --- p.6-2 / Chapter 6.1.2 --- Small polaron models --- p.6-2 / Chapter 6.2 --- Activation energy --- p.6-4 / Chapter 6.3 --- Discussions --- p.6-9 / Chapter Chapter 7 --- Conclusions --- p.7-1
99

Preparation and characterization of ferroelectric yttrium manganite and lead calcium titanate thin films. / Preparation and characterization of ferroelectric YMnO3 and (Pb0.76Ca0.24)TiO3 thin films = Tie dian YMnO3 he (Pb0.76Ca0.24)TiO3 bo mo de zhi bei yu biao zheng / 铁电 YMnO3 和 (Pb0.76Ca0.24)TiO3 薄膜的制备与表征 / CUHK electronic theses & dissertations collection / Preparation and characterization of ferroelectric YMnO3 and (Pb0.76Ca0.24)TiO3 thin films =: 铁电 YMnO3 和 (Pb0.76Ca0.24)TiO3 薄膜的制备与表征 / Tie dian YMnO3 he (Pb0.76Ca0.24)TiO3 bo mo de zhi bei yu biao zheng

January 2002 (has links)
"March 2002." / The numerals in title are subscript. / Thesis (Ph.D.)--Chinese University of Hong Kong, 2002. / Includes bibliographical references. / Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. / Mode of access: World Wide Web. / Abstracts in English and Chinese.
100

Fabrication and characterization of Nafion based microactuators. / CUHK electronic theses & dissertations collection

January 2003 (has links)
Zhou Wenli. / "October 2003." / Thesis (Ph.D.)--Chinese University of Hong Kong, 2003. / Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. / Mode of access: World Wide Web. / Abstracts in English and Chinese.

Page generated in 0.04 seconds