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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
1

Reliable gate dielectric for low-temperature thin-film transistors using plasma nitridation /

Or, Chin-tung, David. January 2002 (has links)
Thesis (M. Phil.)--University of Hong Kong, 2002. / Includes bibliographical references.
2

Analyses of device characteristics in low voltage p-, new material n-, and dual-channel organic field-effect transistors

Jeong, Yeon Taek, January 1900 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2008. / Vita. Includes bibliographical references.
3

The effects of silicon, nitrogen and oxygen incorporation and oxygen-scavenging technique on performances of hafnium-based gate dielectric MOSFETs

Choi, Changhwan. January 1900 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2006. / Vita. Includes bibliographical references.
4

Process development, characterization, transient relaxation, and reliability study of HfO₂ and HfSi(x)O(y) gate oxide for 45nm technology and beyond

Akbar, Mohammad Shahariar. Lee, Jack Chung-Yeung, January 2005 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2005. / Supervisor: Jack C. Lee. Vita. Includes bibliographical references.
5

High-K dielectrics for scaled CMOS and SANOS nonvolatile semiconductor memory devices /

Zhao, Yijie, January 2006 (has links)
Thesis (Ph. D.)--Lehigh University, 2006. / Includes vita. Includes bibliographical references (leaves 121-133).
6

A study on electrical and material characteristics of hafnium oxide with silicon interface passivation on III-V substrate for future scaled CMOS technology

Ok, Injo, January 1900 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2008. / Vita. Includes bibliographical references.
7

III-V channel MOS devices with atomic-layer-deposited high-k gate dielectrics interface and carrier transport studies /

Shahrjerdi, Davood, January 1900 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2008. / Vita. Includes bibliographical references.

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