Abstract
The work presented in this thesis is intend to develop the required technologies for fabrication optical interconnection between a single mode fiber (SMF) and a hybrid antiresonant reflection optical waveguide(ARROW). In addition, the coupling characteristic between the SMF and ARROW are theoretically investigated.
The fabrication of the optical interconnection includes three major techniques: fabrication of hybrid ARROW waveguide, V groove formation and U groove deep etching. The ARROW waveguide centered at 1.3mm was fabrication using semiconductor process technologies. Propagation losses of the device as low as 0.6dB/cm for TE polarized and 2.55dB/cm for TM were obtained. Anisotropic etching of Si-V grooves were formed using EDP solution, and room temperature sputtered Ta2O5 was used as the etch mask. At a etching temperature of 1200C, the under cut is 1.6mm. In order to increase the coupling efficiencies, we employed the U groove deep etching to reduce the distance from SMF to ARROW . The trenches with a depth 58mm were etched with SF6/O2 dry etching.
Based on our calculation, the coupling efficiency as high as 90% can be obtained when the hybrid ARROW has a core thickness and a waveguide width of 12mm. The 3-dB alignment tolerance in X and Y directions between the SMF and ARROW are ¡Ó3.6mm and¡Ó3.7mm respectively.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0616100-140426 |
| Date | 16 June 2000 |
| Creators | Lee, Kuan-Mo |
| Contributors | A.K Chu |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0616100-140426 |
| Rights | unrestricted, Copyright information available at source archive |
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