Analysis and correction of three-dimensional proximity effect in binary E-beam nanolithography

Description

Thesis(M.S.)--Auburn University, 2007. / Abstract. Vita. Includes bibliographic references.

Links & Downloads

1. http://repo.lib.auburn.edu/2006%20Fall/Theses/ANBUMONY_KASI_19.pdf

Tags

Lithography, Electron beam. Electrons

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/226970437
Date	January 2007
Creators	Anbumony, Kasi Lakshman Karthi, Lee, Soo-Young.
Publisher	Auburn, Ala. ,
Source Sets	OCLC
Language	English
Detected Language	English