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The Fabrication of 3D Submicron Glass Structures by FIB

The fabrication characteristic of focused ion beam (FIB) for Pyrex glass was investigated. FIB has several advantages such as high sensitivity, high material removal rates, low forward scattering, and direct fabrication in selective area without any etching mask, etc. In this study, FIB etched Pyrex glass was used for fast fabrication of 3-D submicron structures. A high-aspect-ratio (HRA) glass structure of 5 (1.97µm depth/0.39µm width) was fabricated. The experimental results in terms of limiting beam size, ion dose¡]ion/cm2¡^, beam current, etc was discussed. Xenon difluoride (XeF2) was applied to enhance the FIB process. Its influence on glass fabrication is studied and characterized.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0817106-164250
Date17 August 2006
CreatorsWu, Jhih-rong
ContributorsCheng-tang Pan, Yuang-cherng Chiou, Chien-hsiang Chao
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0817106-164250
Rightscampus_withheld, Copyright information available at source archive

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