Some aspects on dielectric breakdown in metal-silicon dioxide-silicon capacitors.

Description

Lai Kam Kwong. / Thesis (M.Sc.)--Chinese University of Hong Kong. / Bibliography: leaves 86-89.

Links & Downloads

1. cuhk:320904
2. http://library.cuhk.edu.hk/record=b5886718
3. http://repository.lib.cuhk.edu.hk/en/item/cuhk-320904

Tags

Dielectrics

Silicon oxide films

Additional Fields

Identifer	oai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_320904
Date	January 1974
Contributors	Lai, Kam Kwong., Chinese University of Hong Kong Graduate School. Division of Electronics.
Publisher	Chinese University of Hong Kong
Source Sets	The Chinese University of Hong Kong
Language	English
Detected Language	English
Type	Text, bibliography
Format	print, [6], 89 leaves : ill. ; 28 cm.
Rights	Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/)