Process development, material analysis, and electrical characterization of ultra thin hafnium silicate films for alternative gate dielectric application

Description

Not available / text

Links & Downloads

1. http://hdl.handle.net/2152/10984

Tags

Hafnium--Anaylsis

Hafnium--Thermal properties

Dielectric films

Thin films--Electric properties

Additional Fields

Identifer	oai:union.ndltd.org:UTEXAS/oai:repositories.lib.utexas.edu:2152/10984
Date	21 April 2011
Creators	Gopalan, Sundararaman
Source Sets	University of Texas
Language	English
Detected Language	English
Format	electronic
Rights	Copyright is held by the author. Presentation of this material on the Libraries' web site by University Libraries, The University of Texas at Austin was made possible under a limited license grant from the author who has retained all copyrights in the works., Restricted