In this thesis the concept of inhomogeneous
dielectrics is demonstrated for various optical coating
applications. Compositionally-varying silicon oxynitride
(SiON) dielectric layers, with the refractive index
varying as a function of position, are grown by computer-controlled
plasma-enhanced chemical vapor deposition
(PECVD) using silane, nitrogen, and nitrous oxide reactant
gases. Compositionally graded and superlattice-like SiON
layers are grown and their compositional profiles are
confirmed by Auger electron spectroscopy sputter
profiling. Inhomogeneous antireflection coatings and
rugate filters, with sinusoidally varying refractive index
profiles, are designed and fabricated and their measured
spectral responses are found to be in excellent agreement
with simulated results. Alternating-current thin film
electroluminescent (ACTFEL) devices with multiple layer
dielectrics also are designed, fabricated, and the
insulating layers are shown to increase the optical
outcoupling efficiency of an ACTFEL devices by
approximately 14 % compared to that of a conventional
ACTFEL structure. / Graduation date: 1993
| Identifer | oai:union.ndltd.org:ORGSU/oai:ir.library.oregonstate.edu:1957/36856 |
| Date | 06 May 1993 |
| Creators | Lim, Sungkyoo |
| Contributors | Wager, John F. |
| Source Sets | Oregon State University |
| Language | en_US |
| Detected Language | English |
| Type | Thesis/Dissertation |
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