In recent years, even though the light output of GaN-related LED continues to increase, the brightness is still low compared to conventional lighting systems and it is necessary to further improve the light extraction of LEDs.
In this study, the characteristics of LPD-SiO2 film and Al/SiO2/GaN MOS diode were investigated in advance of the formation of SiO2 micro structure for improving the oxide quality and controlling the deposition parameters. Temperature-difference method, post-annealing treatment, photochemical treatment, sulfurated treatment and etc. were used for the purposes of better properties of the MOS structure and the LED. To obtain higher light extraction efficiency of GaN LED, hemispherical SiO2 microlens was formed on the conventional and the flip-chip LEDs. The deposition mechanism had been developed to obtain the further improvements on the electrical and optical properties. The influences of epoxy encapsulation on the LEDs without and with microlens were also studied.
Considering the refractive index of SiO2 is close to that of the epoxy, the enhancements of light extraction efficiency and angular optical distribution of GaN LED by using SiO2 microlens will be degraded after encapsulating. Therefore, we also tried to deposit ZnO film and rod on GaN LED by LPD method to maintain or further enhance the light extraction efficiency of GaN LEDs by the combining the micro structure and the epoxy encapsulation.
Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0715108-141932 |
Date | 15 July 2008 |
Creators | Ho, Chen-Lin |
Contributors | Mei-Ying Chang, Li-Wei Tu, Ray-Ming Lin, Kuo-Mei Chen, Ming-Kwei Lee, Yeong-Her Wang, Tsu-Hsin Chang |
Publisher | NSYSU |
Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
Language | English |
Detected Language | English |
Type | text |
Format | application/pdf |
Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0715108-141932 |
Rights | campus_withheld, Copyright information available at source archive |
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