Identifer | oai:union.ndltd.org:NAGOYA/oai:ir.nul.nagoya-u.ac.jp:2237/14528 |
Date | 02 1900 |
Creators | Okubo, Hitoshi, Takei, Masafumi, Hoshina, Yoshikazu, Hanai, Masahiro, Kato, Katsumi, Kurimoto, Muneaki |
Publisher | IEEE |
Source Sets | Nagoya University |
Language | English |
Detected Language | English |
Type | Article(author) |
Rights | © 2010 IEEE. Reprinted, with permission, from Kurimoto, Muneaki; Kato, Katsumi; Hanai, Masahiro; Hoshina, Yoshikazu; Takei, Mmasafumi; Okubo, Hitoshi, Application of functionally graded material for reducing electric field on electrode and spacer interface, Dielectrics and Electrical Insulation, IEEE Transactions on, Feb/2010 |
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