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Residual stress in gallium nitride films grown on silicon substrates by metalorganic chemical vapor deposition

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Identiferoai:union.ndltd.org:OhioLink/oai:etd.ohiolink.edu:ohiou1171653515
Date January 2000
CreatorsFu, Yankun
PublisherOhio University / OhioLINK
Source SetsOhiolink ETDs
LanguageEnglish
Detected LanguageEnglish
Typetext
Sourcehttp://rave.ohiolink.edu/etdc/view?acc_num=ohiou1171653515
Rightsunrestricted, This thesis or dissertation is protected by copyright: all rights reserved. It may not be copied or redistributed beyond the terms of applicable copyright laws.

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