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Single event effects and radiation hardening methodologies in SiGe HBTs for extreme environment applications

Field-effect transistor technologies have been critical building blocks for
satellite systems since their introduction into the microelectronics industry. The
extremely high cost of launching payloads into orbit necessitates systems to have
small form factor, ultra low-power consumption, and reliable lifetime operation,
while satisfying the performance requirements of a given application. Silicon-based
complementary metal-oxide-semiconductors (Si CMOS) have traditionally been able to
adequately meet these demands when coupled with radiation hardening techniques that
have been developed over years of invested research. However, as customer demands
increase, pushing the limits of system throughput, noise, and speed, alternative
technologies must be employed. Silicon-germanium BiCMOS platforms have been
identfied as a technology candidate for meeting the performance criteria of these
pioneering satellite systems and deep space applications, contingent on their ability to
be hardened to radiation-induced damage. Given that SiGe technology is a relative new-
comer to terrestrial and extra-terrestrial applications in radiation-rich environments,
the same wealth of knowledge of time-tested radiation hardening methodologies has
not been established as it has for Si CMOS. Although SiGe BiCMOS technology has
been experimentally proven to be inherently tolerant to total-ionizing dose damage
mechanism, the single event susceptibility of this technology remains a primary concern.
The objective of this research is to characterize the physical mechanisms that drive the
origination of ion-induced transient terminal currents in SiGe HBTs that subsequently
lead to a wide range of possible single event phenomena. Building upon this learning,
a variety of device-level hardening methodologies are explored and tested for efficacy.

Identiferoai:union.ndltd.org:GATECH/oai:smartech.gatech.edu:1853/45854
Date10 October 2012
CreatorsPhillips, Stanley David
PublisherGeorgia Institute of Technology
Source SetsGeorgia Tech Electronic Thesis and Dissertation Archive
Detected LanguageEnglish
TypeDissertation

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