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Diffusion-barrier properties and thermal stability of TiAlSiCN, TiAlSiCN/SiBCN, and TiAlSiCN/AlOx films

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Identiferoai:union.ndltd.org:DRESDEN/oai:qucosa:de:qucosa:31668
Date17 September 2018
CreatorsKiryukhantsev-Korneev, Ph.V., Kuptsov, K.A., Sagalova, T.B., Shvindina, N.V., Bondarev, A.V.
Source SetsHochschulschriftenserver (HSSS) der SLUB Dresden
LanguageEnglish
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/acceptedVersion, doc-type:article, info:eu-repo/semantics/article, doc-type:Text
Rightsinfo:eu-repo/semantics/openAccess
Relation72, urn:nbn:de:bsz:15-qucosa2-315695, qucosa:31569

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