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Study of stress relaxation and electromigration in Cu/low-k interconnects

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Identiferoai:union.ndltd.org:UTEXAS/oai:repositories.lib.utexas.edu:2152/2374
Date28 August 2008
CreatorsYoon, Sean Jhin
Source SetsUniversity of Texas
LanguageEnglish
Detected LanguageEnglish
TypeThesis, text
Formatelectronic
RightsCopyright is held by the author. Presentation of this material on the Libraries' web site by University Libraries, The University of Texas at Austin was made possible under a limited license grant from the author who has retained all copyrights in the works.

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