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Efficient finite-difference schemes in thermal analysis and inverse lithography for integrated circuit manufacturing

published_or_final_version / Electrical and Electronic Engineering / Doctoral / Doctor of Philosophy

  1. 10.5353/th_b4545504
  2. b4545504
Identiferoai:union.ndltd.org:HKU/oai:hub.hku.hk:10722/132960
Date January 2010
CreatorsShen, Yijiang., 沈逸江.
ContributorsWong, N, Lam, EYM
PublisherThe University of Hong Kong (Pokfulam, Hong Kong)
Source SetsHong Kong University Theses
LanguageEnglish
Detected LanguageEnglish
TypePG_Thesis
Sourcehttp://hub.hku.hk/bib/B45455041
RightsThe author retains all proprietary rights, (such as patent rights) and the right to use in future works., Creative Commons: Attribution 3.0 Hong Kong License
RelationHKU Theses Online (HKUTO)

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