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Analysis and correction of three-dimensional proximity effect in binary E-beam nanolithography

Thesis(M.S.)--Auburn University, 2007. / Abstract. Vita. Includes bibliographic references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/226970437
Date January 2007
CreatorsAnbumony, Kasi Lakshman Karthi, Lee, Soo-Young.
PublisherAuburn, Ala. ,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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