The magnetic field is a key feature that distinguishes magnetron sputtering from simple diode
sputtering. It effectively increases the residence time of electrons close to the cathode surface
and by that increases the energy efficiency of the discharge. This becomes apparent in high
power impulse magnetron sputtering (HiPIMS) discharges, as small changes in the magnetic
field can result in large variations in the discharge characteristics, notably the peak discharge
current and/or the discharge voltage during a pulse. Here, we analyze the influence of the
magnetic field on the electron density and temperature, how the discharge voltage is split
between the cathode sheath and the ionization region, and the electron heating mechanism in a
HiPIMS discharge. We relate the results to the energy efficiency of the discharge and discuss
them in terms of the probability of target species ionization. The energy efficiency of the
discharge is related to the fraction of pulse power absorbed by the electrons. Ohmic heating of
electrons in the ionization region leads to higher energy efficiency than electron energization in
the sheath. We find that the electron density and ionization probability of the sputtered species
depend largely on the discharge current. The results suggest ways to adjust electron density and
electron temperature using the discharge current and the magnetic field, respectively, and how
they influence the ionization probability.
| Identifer | oai:union.ndltd.org:DRESDEN/oai:qucosa:de:qucosa:85137 |
| Date | 03 May 2023 |
| Creators | Rudolph, M., Brenning, N., Hajihoseini, H., Raadu, M.A., Minea, T.M., Anders, André, Gudmundsson, J.T., Lundin, D. |
| Publisher | IOP Publishing |
| Source Sets | Hochschulschriftenserver (HSSS) der SLUB Dresden |
| Language | English |
| Detected Language | English |
| Type | info:eu-repo/semantics/publishedVersion, doc-type:article, info:eu-repo/semantics/article, doc-type:Text |
| Rights | info:eu-repo/semantics/openAccess |
| Relation | 1361-6463, 015202 |
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