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Generalized inverse lithography methods for phase-shifting mask design

Thesis (M.E.E.)--University of Delaware, 2007. / Principal faculty advisor: Gonzalo Arce, Dept. of Electrical and Computer Engineering. Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/173298610
Date January 2007
CreatorsMa, Xu.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceAccess to citation, abstract and download form provided by ProQuest Information and Learning Company; downloadable PDF file, 38 p.

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