Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition

Description

Thesis (Ph. D.)--University of Texas at Austin, 2001. / Vita. Includes bibliographical references. Available also from UMI Company.

Links & Downloads

1. http://www.lib.utexas.edu/etd/r/d/2001/r188/rathsackb016.pdf#page=2
2. http://wwwlib.umi.com/cr/utexas/fullcit?p3035170

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Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/50805159
Date	January 2001
Creators	Rathsack, Benjamen Michael.
Source Sets	OCLC
Language	English
Detected Language	English
Source	Access restricted to users with UT Austin EID