Return to search

Interfacial fluid pressure and pad viscoelasticity during chemical meachanical polishing

No description available.
Identiferoai:union.ndltd.org:GATECH/oai:smartech.gatech.edu:1853/16715
Date05 1900
CreatorsHight, J. Robert
PublisherGeorgia Institute of Technology
Source SetsGeorgia Tech Electronic Thesis and Dissertation Archive
Detected LanguageEnglish
TypeThesis
RightsAccess restricted to authorized Georgia Tech users only.

Page generated in 0.0019 seconds