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Characterization of GaN grown on tilt-cut £^-LiAlO 2 by molecular beam epitaxy for different growth temperatures

We study the properties of m-plane GaN structure on LiAlO 2 substrate grown by
plasma-assisted molecular-beam epitaxy (PAMBE). Lattice parameters of LiAlO 2 are
close to GaN, the interface between LiAlO 2 and GaN showed a good lattice matching.
Low lattice mismatch can reduce the defect generation, improve crystal quality.
However, lattice mismatch still exist, more or less density of defect still can be
observed. The density of defect was reduced in the sample at high temperature.
In this study, we investigate GaN on LiAlO 2 by scanning electron microscope
(SEM), atomic force microscope (AFM), photoluminescence (PL) and X-ray
diffraction (XRD) for different growth temperatures.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0719111-203858
Date19 July 2011
CreatorsLin, Yu-Chiao
ContributorsMitch Chou, Ikai Lo, Ming-Kwei Lee
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0719111-203858
Rightsuser_define, Copyright information available at source archive

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