The punch-through space-charge-limited load (PTSCLL) may be an alternate VLSI design as a high resistance load device. A surface and geometrical study on the PTSCLL device is presented. From this research, it is found out that the dynamic resistance value increases as the surface bias to a negatively voltage. Also, the resistance increases as the channel length and substrate doping increase. But the resistance value decreases as the channel width, junction depth, and overlap oxide thickness increase. Incorporate these design considerations, it can maximize the resistance value of the PTSCLL.
| Identifer | oai:union.ndltd.org:arizona.edu/oai:arizona.openrepository.com:10150/276733 |
| Date | January 1988 |
| Creators | Liu, Bin, 1957- |
| Contributors | Mattson, Roy H. |
| Publisher | The University of Arizona. |
| Source Sets | University of Arizona |
| Language | en_US |
| Detected Language | English |
| Type | text, Thesis-Reproduction (electronic) |
| Rights | Copyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author. |
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