Return to search

Development and advanced characterization of novel chemically amplified resists for next generation lithography

Thesis (Ph.D)--Chemical Engineering, Georgia Institute of Technology, 2009. / Committee Chair: Clifford L. Henderson; Committee Member: Dennis W. Hess; Committee Member: Joseph W. Perry; Committee Member: Laren M. Tolbert; Committee Member: William J. Koros. Part of the SMARTech Electronic Thesis and Dissertation Collection.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/642326221
Date January 2008
CreatorsLee, Cheng-Tsung.
PublisherAtlanta, Ga. : Georgia Institute of Technology,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceAvailable online, Georgia Institute of Technology:

Page generated in 0.0016 seconds