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The Global ETD Search service is a free service for researchers
to find electronic theses and dissertations. This service is
provided by the
Networked Digital Library of Theses and Dissertations.
Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
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Showing 1 to 6 of 6 (0.055 seconds)Spelling suggestions: "subject:"photoresists. microlithography."" "subject:"photoresists. microlitvhography.""
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Understanding fundamental mechanisms of photoresist dissolutionBurns, Sean David. January 2003 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2003. / Vita. Includes bibliographical references. Available also from UMI Company.
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| 2 |
Catalyst diffusion in positive-tone chemically amplified photoresistsStewart, Michael Dean, Willson, C. G. January 2003 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2003. / Supervisor: C. Grant Willson. Vita. Includes bibliographical references. Available also from UMI Company.
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| 3 |
Design, synthesis, and optimization of materials for 193 nm and 157 nm photoresists /Patterson, Kyle William, January 2000 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 178-183). Available also in a digital version from Dissertation Abstracts.
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| 4 |
Exploration of non-chemically amplified resists based on dissolution inhibitors for 193 nm lithography /Baylav, Burak. January 2010 (has links)
Thesis (M.S.)--Rochester Institute of Technology, 2010. / Typescript. Includes bibliographical references (leaves 45-47).
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| 5 |
Design and study of advanced photoresist materials : positive tone photoresists with reduced environmental impact and materials for 157 nm lithography /Yamada, Shintaro, January 2000 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 266-276). Available also in a digital version from Dissertation Abstracts.
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| 6 |
Development and advanced characterization of novel chemically amplified resists for next generation lithographyLee, Cheng-Tsung. January 2008 (has links)
Thesis (Ph.D)--Chemical Engineering, Georgia Institute of Technology, 2009. / Committee Chair: Clifford L. Henderson; Committee Member: Dennis W. Hess; Committee Member: Joseph W. Perry; Committee Member: Laren M. Tolbert; Committee Member: William J. Koros. Part of the SMARTech Electronic Thesis and Dissertation Collection.
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