Deposition of epitaxial Si/Si-Ge/Ge and novel high-K gate dielectrics using remote plasma chemical vapor deposition

Description

Thesis (Ph. D.)--University of Texas at Austin, 2003. / Vita. Includes bibliographical references. Available also from UMI Company.

Links & Downloads

1. http://www.lib.utexas.edu/etd/r/d/2003/chenx036/chenx036.pdf#page=3
2. http://wwwlib.umi.com/cr/utexas/fullcit?p3116282

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Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/54914430
Date	January 2003
Creators	Chen, Xiao,
Source Sets	OCLC
Language	English
Detected Language	English