Global ETD Search

1	In-situ deposition of YBa₂Cu₃O₇₋x superconducting films by aerosol decomposition in a plasma enhanced chemical vapor deposition reactor Chung, Yong-Sun 12 1900 (has links) No description available. Superconductors
2	The application and limitations of PECVD for silicon-based photonics / Spooner, Marc. January 2005 (has links) Thesis (Ph.D.)--Australian National University, 2005.
3	The use of plasma-generated silicon dioxide-like coatings as charge storage media for electrets / Lin, Xiaorong. January 1993 (has links) Thesis (M.S.)--Rochester Institute of Technology, 1993. / Typescript. Includes bibliographical references (leaves 79-80).
4	Deposition of gate quality dielectrics for Si/Si-Ge heterostructure devices using remote plasma chemical vapor deposition / Sharma, Rajan, January 1999 (has links) Thesis (Ph. D.)--University of Texas at Austin, 1999. / Vita. Includes bibliographical references (leaves 140-145). Available also in a digital version from Dissertation Abstracts.
5	Carbon Nanotube Growth Using Ni Catalyst in Different Layouts Nguyen, H. Q., Krishnan, R., Choi, K. W., Thompson, Carl V., Lim, F. Y. 01 1900 (has links) Vertically aligned carbon nanotubes have been grown using Ni as catalyst by plasma enhanced chemical vapor deposition system (PECVD) in various pre-patterned substrates. Ni was thermally evaporated on silicon substrates with anodized alumina mask prepared in different methods including 2 step anodization of porous alumina template and interference lithography assisted array of pores. The templates helped to define Ni nanodots inside the pores which in turn catalyzed the growth of carbon nanotubes inside the PECVD system at temperature of 700-750C using mixture of ammonia and acetylene gases. The resulting well-aligned multi-walled carbon nanotubes were further investigated using SEM, TEM and Raman spectroscopy. The size, shape and structure of the grown carbon nanotubes were also discussed. / Singapore-MIT Alliance (SMA) Nickel Carbon nanotubes
6	Plasma deposition and treatment by a low temperature cascade arc torch / Yu, Qingsong, January 1998 (has links) Thesis (Ph. D.)--University of Missouri-Columbia, 1998. / Typescript. Vita. Includes bibliographical references (leaves 154-161). Also available on the Internet.
7	Effect of cosputtered catalyst on growth and alignment of carbon nanotubes by plasma enhanced chemical vapor deposition / Gunderson, Eric P. January 1900 (has links) Thesis (M.S.)--Oregon State University, 2010. / Printout. Includes bibliographical references (leaves 85-92). Also available on the World Wide Web.
8	Deposition of epitaxial Si/Si-Ge/Ge and novel high-K gate dielectrics using remote plasma chemical vapor deposition Chen, Xiao, January 2003 (has links) Thesis (Ph. D.)--University of Texas at Austin, 2003. / Vita. Includes bibliographical references. Available also from UMI Company.
9	Plasma deposition and treatment by a low temperature cascade arc torch Yu, Qingsong, January 1998 (has links) Thesis (Ph. D.)--University of Missouri-Columbia, 1998. / Typescript. Vita. Includes bibliographical references (leaves 154-161). Also available on the Internet.
10	Deposition of epitaxial Si/Si-Ge/Ge and novel high-K gate dielectrics using remote plasma chemical vapor deposition Chen, Xiao, 1972- 29 June 2011 (has links) Not available / text Epitaxy Thin films Dielectrics

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