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液相脈衝電漿放電法製備高純度之次微米級Al(OH)3及其應用 / Preparation of the High Purity Submicron Al(OH)3 by Pulsed Discharge Plasma in Water

摘要 i
Abstract ii
誌謝 iv
表目錄 vii
圖目錄 1
一、 緒論 6
1-1前言 6
1-2研究動機與目的 7
1-3氫氧化鋁介紹 8
1-3-1氫氧化鋁結構 9
1-3-2氫氧化鋁之應用 10
1-4氧化鋁介紹 11
1-4-1氧化鋁晶型及結構 13
1-4-2氧化鋁之應用 16
二、 文獻回顧 17
2-1電漿定義及特徵 17
2-1-1非熱電漿之理論 21
2-1-2液相脈衝電漿之原理 24
2-1-3顆粒形成流程 28
2-1-4電漿法製備無機物粉末 30
2-2 製備α相氧化鋁粉末 41
2-2-1拜耳法 43
2-2-2溶膠凝膠法 48
2-2-3水熱法 50
2-2-4機械球磨法 56
2-2-5沉澱法 57
2-2-6燃燒法 59
三、 實驗方法與步驟 60
3-1實驗藥品與設備 60
3-2研究內容 63
3-3實驗流程與架構 65
3-4 本實驗設計之綠能特色 68
四、 結果與討論 69
4-1 氫氧化鋁之產量及反應機構 69
4-2氫氧化鋁之X-Ray繞射儀分析(X-Ray Diffractometer,XRD) 74
4-3氫氧化鋁之EDS(X-Ray energy dispersive spectrometer)分析 77
4-4氫氧化鋁之FE-SEM分析 78
4-5氫氧化鋁之粒徑分析 91
4-6氫氧化鋁之比表面積分析分析 94
4-7氧化鋁之鍛燒溫度探討 98
4-8氧化鋁之持溫時間探討 105
4-9氧化鋁添加硝酸銀之探討 111
4-10氧化鋁添加造孔劑之探討 118
五、 結論 124
六、 未來工作 126
參考文獻 127

Identiferoai:union.ndltd.org:TW/102YUNT0661021
Date January 1900
Creators廖冠宇, Guan-Yu Liao
Contributors楊肇政, Chao-Chen Yang
Publisher國立雲林科技大學, 化學工程與材料工程系
Source SetsNational Digital Library of Theses and Dissertations in Taiwan
Language中文
Detected LanguageUnknown
Type碩士
Format142
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