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The Influence of Sputtering Pressure and Film Thickness on Metal Resistivity

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Identiferoai:union.ndltd.org:LACETR/oai:collectionscanada.gc.ca:AEU.uuid#d4090a32-f44d-4478-b2d0-1676cbb0cad3
CreatorsXu, Can
PublisherUniversity of Alberta
Source SetsLibrary and Archives Canada ETDs Repository / Centre d'archives des thèses électroniques de Bibliothèque et Archives Canada
LanguageEnglish
Detected LanguageEnglish
TypeThesis
Formatapplication/pdf

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