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Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4/O2 and SF6/O2 plasmas

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Identiferoai:union.ndltd.org:NAGOYA/oai:ir.nul.nagoya-u.ac.jp:2237/12625
Date29 June 2009
CreatorsMiwa, Kazuhiro, Takada, Noriharu, Sasaki, Koichi
PublisherAmerican Institite of Physics
Source SetsNagoya University
Languageen_US
Detected LanguageEnglish
TypeArticle(publisher)
RightsCopyright (2009) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior per mission of the author and the American Institute of Physics.

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