The fabrication characteristic of focused ion beam (FIB) for fused quartz was investigated. With the progress of nanotechnology, new technologies and devices are invented constantly. In nanofabrication, FIB has several advantages such as high material removal rate, high resolving power and direct fabrication in some selected areas without etching mask. Therefore, it had been studied in detail to fabricate nano-structures by FIB. In this study, we found out the effect of nano-machining by adjusting the parameters of FIB system such as: beam current, overlap, and dwell time. The fabricated features together with their surface morphology and profile were investigated by scanning electron microscope (SEM) and atomic force microscope (AFM). Results show that when beam current was smaller, overlap was 50% and dwell time was 10£gs could get best performance by FIB.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0725108-141846 |
| Date | 25 July 2008 |
| Creators | Yang, Shun-Jie |
| Contributors | Tsai, Nan-Chyuan, Pan, Cheng-Tang, Chao,Chien-Hsiang, Lin, Che-Hsin |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0725108-141846 |
| Rights | withheld, Copyright information available at source archive |
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