Return to search

Growth and Characterization of Thin MoS2 Layers by CVD

The contribution describes the construction of a CVD system, the deposition of thin molybdenum disulphide layers using this system and the analysis of the samples produced. The deposition of thin molybdenum disulphide layers and an intercalation of the silicon carbide substrate used were demonstrated and the measurement results obtained by atomic force microscopy and photoelectron spectroscopy were further discussed.

Identiferoai:union.ndltd.org:DRESDEN/oai:qucosa:de:qucosa:92126
Date24 June 2024
CreatorsNordheim, Gregor
ContributorsWanke, Martina, Schütze, Adrian, Speck, Florian, Seyller, Thomas, Deutsche Physikalische Gesellschaft e. V.
Source SetsHochschulschriftenserver (HSSS) der SLUB Dresden
LanguageEnglish
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/acceptedVersion, doc-type:conferenceObject, info:eu-repo/semantics/conferenceObject, doc-type:Text
Rightsinfo:eu-repo/semantics/openAccess
Relation10.1002/admi.202300725

Page generated in 0.0027 seconds